Structural and optical properties of nickel oxide thin films prepared by chemical bath deposition and by spray pyrolysis techniques

Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation

“…It is found that from the figures, the deduced band gap energy of NiO films are in range of 3.20-3.51 eV. The band gap value of the NiO films obtained in the present work closely matches with the value reported by many authors [8,11,14,[20][21][22][23].…”

“…In recent years, the preparation and characterization of nanostructure nickel oxide (NiO) have gained considerable attentions of many scientists, due to excellent properties [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20]. The properties of NiO thin films, which make it suitable for the different applications, are excellent durability, low material cost and wide optical band gap in the range of 3.6 -4 eV, excellent electrical and optical properties .…”

“…Some applications of NiO thin films include gas sensors [1][2][3][4][5], positive electrode in Li-ion batteries [9], electrochromic display devices [12] and metal-isolator-metal tunnel junction diode [11]. NiO films can be fabricated by different physical and chemical deposition techniques such as DC and RF magnetron sputtering [2,6,[11][12][13][14][15], thermal oxidation [16][17][18], chemical deposition [19,20], pulsed laser deposition [9], spray pyrolysis [21] and sol-gel [23]. An alternative method for preparation of NiO films that recently was reported by our research group is plasma oxidation of nickel thin films [7].…”

Effect of precursor solutions on the structural and optical properties of sprayed NiO thin films

“…in addition, the internal electric field due to the impurities distributions as confirmed by XPS results. The optical band gap energy (Eg) of films is calculated on the basis of the optical absorption spectra [21].…”

“…Up to date, a number of techniques have been advanced in the preparation of nickel oxide thin films, such as dipping and electrochemical, spin coating [12], atomic layer deposition, sol-gel [13], sputtering [14][15], pulsed laser deposition [16], chemical bath deposition [17][18][19] and chemical spray pyrolysis [20][21][22][23]. The most common and sheep fabrication method for large area homogeneous coatings of NiO is chemical spray pyrolysis due to the cancellation of the vacuum system and it is an easy setting up technique.…”