Structural and optical properties of nanocrystalline α-MoO3 thin films prepared at different annealing temperatures

Hojabri, Alireza; Hajakbari, Fatemeh; Meibodi, Ali Emami

doi:10.1007/s40094-014-0161-5

Cited by 54 publications

(11 citation statements)

References 17 publications

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“…The sharpness and number of the hills increased after annealing time of 60 min. Also we can observe the growth of columnar structure on the surface of the films due to the grain nucleation and growth during the crystallization process [16]. The root mean square roughness (R rms ) and average roughness (R a ) of prepared films are shown in Fig.…”

Section: Resultsmentioning

confidence: 89%

Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

Hojabri

2016

J Theor Appl Phys

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Zirconium oxide thin films were grown successfully by thermal annealing of zirconium thin films deposited on quartz and silicon substrates by direct current magnetron sputtering technique. The structural and optical properties in relation to thermal annealing times were investigated. The X-ray diffraction patterns revealed that structure of films changes from amorphous to crystalline by increase of annealing times in range 60-240 min. The composition of films was determined by Rutherford back scattering spectroscopy. Atomic force microscopy results exhibited that surface morphology and roughness of films depend on the annealing time. The refractive index of the films was calculated using Swanepoel's method. The optical band gap energy of annealed films decreased from 5.50 to 5.34 eV with increasing thermal annealing time.

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Section: Resultsmentioning

confidence: 89%

Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

Hojabri

2016

J Theor Appl Phys

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“…On the other hand, the lattice vibrations of molybdenum oxides are seen at ∼975 and ∼760 cm −1 that are attributed to the stretching modes of the MoO double bond and Mo−O−Mo, respectively, and the band observed at 560− 570 cm −1 is due to the Mo−O−Mo deformation mode. 19,25,26 Note that in sample MP 150 -I, an additional sharp peak at 1005 cm −1 is obvious and this could have originated from the layered orthorhombic α-MoO 3 phase. 25 Conclusively, the IR spectroscopic study agrees well with the successful formation of molybdenum oxides passivated with PEG molecules.…”

Section: ■ Results and Discussionmentioning

confidence: 99%

Magnetic Circular Dichroism of Substoichiometric Molybdenum Oxide (MoO_3–x) Nanoarchitectures with Polaronic Defects

Kimura

Yao

2019

J. Phys. Chem. C

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Magnetic circular dichroism (MCD) is demonstrated for the first time in substoichiometric molybdenum oxide (MoO 3−x ) nanoarchitectures to explore the origin of their near-IR (NIR) transitions. Various nanostructures of MoO 3−x are synthesized by a simple hydrothermal process using an ionic Mo(VI) or metallic Mo(0) precursor. The phase, morphology, and spectroscopic properties of the obtained nanostructures are dependent both on the reaction temperature and the molybdenum precursor. In particular, hexagonal MoO 3−x nanostructures are colored blue with different degrees. To better understand the nature of the electronic states in these nanomaterials, MCD spectroscopy is conducted. A derivative-like MCD response is detected in the vis-NIR region, but it is not attributed to surface magnetoplasmonic modes because of the absence of the peak-energy shift with the increasing refractive index of the dispersion medium. Then, the bisignate MCD signal can be attributed to Faraday B-terms for small-polaronic transitions, arising from two interacting polaronic states close in energy that would give opposite signs under an applied magnetic field. We believe that MCD evaluation for polaronic nanomaterials will expand promising new applications in fields such as semiconductor-based nanophotonics and magneto-optical devices.

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“…Here, 'λ' is the wavelength of x-rays, the shape constant 'k' has a value of about 0.9, 'β' is the FWHM (in radian), 'θ' is the Bragg's angle (in radian) [32]. The values of crystallite size for as-deposited CuO film is found to be 16 nm whereas after annealing at 400 and 500 o C, the crystallite size was obtained as 18 and 26 nm respectively.…”

Section: X-ray Diffraction Resultsmentioning

confidence: 99%

Enhanced photodetection performance of sputtered cupric oxide thin film through annealing process

Tariq¹,

Afzal²,

Rafique³

2021

Preprint

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This study demonstrates an improvement in the photodetection response of a Cupric Oxide (CuO) thin film through the annealing process. The CuO thin film (400 nm thickness) was deposited on a silicon substrate using DC magnetron sputtering system. Annealing of the as-deposited film was carried out in a muffle furnace at 400 and 500 oC for two hours. X-ray diffraction pattern revealed the formation of a single phase CuO film whose crystallinity improved with increase of the annealing temperature. The field emission scanning electron microscopy indicated a compact and fine granular strcutre of the as-seposited film whereas the segregation and agglomeration of grains was observed after the film’s annealing. The photodetection performance of CuO film with Al contacts was investigated under the exposure of visible light (λ = 460 nm). The current-voltage graphs of as-deposited and annealed films displayed Schottky contact formation between the metal and semiconductor, owing to a lower work function of Al than that of the CuO. The photo-to-dark current ratio of the device was significantly enhanced after the film’s annealing. The increase in photocurrent became more pronounced upon increasing the light intensity from 58.4 to 511 µW/cm2. The maximum current gain and sensitivity values were found to be 66 and 7086.8 % respectively at 10V bias for the film annealed at 500 oC. The rise and fall time of the Al/CuO/Al photodetector was decreased after the film’s annealing.

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Structural and optical properties of nanocrystalline α-MoO3 thin films prepared at different annealing temperatures

Cited by 54 publications

References 17 publications

Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

Magnetic Circular Dichroism of Substoichiometric Molybdenum Oxide (MoO_3–x) Nanoarchitectures with Polaronic Defects

Enhanced photodetection performance of sputtered cupric oxide thin film through annealing process

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Structural and optical properties of nanocrystalline α-MoO3 thin films prepared at different annealing temperatures

Cited by 54 publications

References 17 publications

Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates

Magnetic Circular Dichroism of Substoichiometric Molybdenum Oxide (MoO3–x) Nanoarchitectures with Polaronic Defects

Enhanced photodetection performance of sputtered cupric oxide thin film through annealing process

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Product

Resources

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Magnetic Circular Dichroism of Substoichiometric Molybdenum Oxide (MoO_3–x) Nanoarchitectures with Polaronic Defects