2009
DOI: 10.1063/1.3139281
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Structural characterization and magnetic profile of annealed CoFeB∕MgO multilayers

Abstract: Magnetic tunnel junctions ͑MTJ͒ have become of strategic importance due to the large tunneling magnetoresistance ratio ͑TMR͒ that they can achieve at room temperature. The largest TMR values observed until now were recorded in MTJs with MgO barriers and CoFeB electrodes after annealing of the junction above the recrystallization temperature of the amorphous CoFeB layers. We have used x-ray reflectivity combined with polarized neutron reflectivity to characterize the structure and the magnetism of ͓Co 60 Fe 20 … Show more

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Cited by 15 publications
(10 citation statements)
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“…Therefore, an annealing process is required to induce crystallization of the as-deposited amorphous CoFeB films to increase TMR ratio [13][14][15]. Lots of works are focused on annealing effects on structural, magnetic and spin dynamic properties of CoFeB films [16][17][18][19][20]. However, thermal related properties and crystallization behavior of the alloy films have not been systematically studied yet [21].…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, an annealing process is required to induce crystallization of the as-deposited amorphous CoFeB films to increase TMR ratio [13][14][15]. Lots of works are focused on annealing effects on structural, magnetic and spin dynamic properties of CoFeB films [16][17][18][19][20]. However, thermal related properties and crystallization behavior of the alloy films have not been systematically studied yet [21].…”
Section: Introductionmentioning
confidence: 99%
“…Fortunately, post-processes are typically depositions, etchings and lithography, operated at low temperatures. When annealing processes for enhancing GMR properties are required [14], the temperature must to be taken into account.…”
Section: Temperature Of Post-process Stepsmentioning
confidence: 99%
“…This is surprising and may be due to the residual boron content in the sample, which suppresses the long range recrystallization process. In a recent study by Vadalá et al 15 of CoFeB/MgO multilayers using different deposition and annealing methods a more pronounced MgO͑002͒ peak was observed. Also You et al 20 report about some recrystallization in CoFeB/MgO͑001͒ bilayers after annealing at 360°C for 1 h, albeit for a much thicker MgO layer of 20 nm instead of 1.6 nm in the present case.…”
Section: High Angle Hard X-ray Diffractionmentioning
confidence: 99%
“…Pym et al and AlO x sharpen considerably upon annealing up to 400°C. In a similar study on CoFeB/MgO multilayers using both x-ray and neutron reflectivity, Vadalá et al 15 not only compared different growth modes for the heterojunctions but also their structural changes upon annealing. In these multilayers the interface properties depend more on the preparation method used, then on the annealing temperature.…”
Section: Introductionmentioning
confidence: 99%