Structural characterization of sputtered PMMA in argon plasma

Bodas, Dhananjay; Gangal, S. A.

doi:10.1016/j.matlet.2005.04.039

Cited by 17 publications

(11 citation statements)

References 14 publications

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“…2 We computed the water Y for PMMA9 to 828 whereas literature reports from 648 to 658 26,27 or $708 28,29 on PMMA films to 1058 for bulk PMMA. 26 The contact angle is normally accepted to reflect the surface property of a polymer being either hydrophobic or hydrophilic (able to wet), however, the actual classification differs considerably. Burton and Bhushan 28 define a surface as hydrophilic when the surface has Y < 908.…”

Section: Resultsmentioning

confidence: 99%

Novel polymers based on atom transfer radical polymerization of 2‐methoxyethyl acrylate

Bednarek

Jankova

Hvilsted

2006

J. Polym. Sci. A Polym. Chem.

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Atom transfer radical polymerization (ATRP) has been employed in the polymerization of 2-methoxyethyl acrylate (MEA) initiated by ethyl 2-bromoisobutyrate in bulk or in toluene solution at 90-95 8C with the catalytic systems Cu(I)Br/PMDETA or HMTETA. Kinetics investigations revealed that ATRP of MEA proceeds in a controlled manner with a first-order plot of monomer consumption, an almost linear molecular weight evolution and polydispersities < 1.29 in the entire conversion range. Welldefined diblock copolymers with PMMA, PMEA-b-PMMA have been produced by use of both PMEA and PMMA macroinitiators, however, for the latter the controlled conditions were somehow difficult to maintain. The amphiphilic behavior of the diblock copolymers lead to phase separation resulting in two glass transition temperatures as detected by DSC. Contact angle (Y) investigations with water on PMEA, PMMA, and diblock copolymers surfaces reveal PMEA as an intermediate hydrophilic with Y $ 508, whereas PMMA and the diblock copolymers all fall in the hydrophobic region with Y > 708.

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Section: Resultsmentioning

confidence: 99%

Novel polymers based on atom transfer radical polymerization of 2‐methoxyethyl acrylate

Bednarek

Jankova

Hvilsted

2006

J. Polym. Sci. A Polym. Chem.

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“…The PMMA films were exposed to CHF 3 gas plasma in a parallel plate reactor (ENIRF) connected to a radiofrequency generator (13.56 MHz). 2 2 Star Factorial Experimental Design [11] (Table 1), with axial levels (√2) and central point, was used to verify the linear or quadratic effect of the plasma variables, gas pressure and time, on the thickness of the plasma deposited polymer. Eleven experiments were carried out with triplicate at the The surfaces of the polymeric films, before and after plasma, were characterized using the following techniques:…”

Section: Methodsmentioning

confidence: 99%

“…PMMA can be deposited by many techniques as plasma polymerization, thermal deposition, RF sputtering, etc [1,2] . In optical devices, PMMA shows the best optical properties among transparent polymers, being a very common core material in polymeric optical fibers, waveguides and optical interconnect [3] .For this, the use of polymers have been studied due to the intrinsic versatility molecular structure that allows advantageous refractive index modeling for core and cladding, and also to their easy fabrication process or patterning capability [4,5] .…”

Section: Introductionmentioning

confidence: 99%

Effect of plasma fluorination variables on the deposition and growth of partially fluorinated polymer over PMMA films

Padilha¹,

Giacon²,

Bartoli³

2013

Polímeros

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Abstract:In this work, an investigation was made of the modification of film surface of Poly(methylmethacrylate) (PMMA) using the plasma polymerization technique. PMMA films 10 µm thick were obtained by Spin-Coating starting from a chloroform solution (15.36% w/w). The films were exposed to the plasma of CHF 3 at different gas pressures and exposure times to increase the thickness of fluorinated polymers onto PMMA films. The plasma fluorinated optical films were characterized by gravimetry, FTIR-ATR, contact angle of wetting, SEM and AFM. The surface fluorination of PMMA films can be inferred by the increase in contact angle under all experimental conditions, and confirmed with FTIR-ATR analysis. Gravimetry showed an increase of the fluorinated polymer layer over PMMA films, being 1.55 µm thick at 0.7 torr and 40 minutes of plasma exposure. The SEM analysis showed a well-defined layer of fluorinated polymer, with fluorine being detected in the EDS analysis. The film roughness for the fluorinated polymers was around of 200 Å, quite satisfactory for a 1.55 µm cladding.

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“…8 The sputtering system consisted of a quartz chamber, feedthroughs for a gas inlet, and a pressure measurement and electrode assembly. Parallel plates made of copper were used as electrodes for plasma excitation, and argon was used as a carrier gas.…”

Section: Methodsmentioning

confidence: 99%

Poly(methyl methacrylate) as masking material for microelectromechanical system (MEMS) fabrication

Bodas

Gangal

2006

J of Applied Polymer Sci

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In the present study direct current (dc) sputtered poly(methyl methacrylate) (PMMA) films deposited on silicon substrates were evaluated as masking materials for anisotropic etching of silicon in aqueous potassium hydroxide (KOH) and tetramethyl ammonium hydroxide (TMAH) solutions. Sputtered PMMA films were characterized by FTIR to ascertain the bonding, by X-ray photoelectron spectroscopy (XPS) for the elemental composition, and by the contact angle for measuring the adhesion of the film with the substrate. FTIR and XPS data showed the presence of a poly(tetrafluoroethylene)-like film on the silicon substrate. The interfacial tension was calculated from the contact angle value, which was 0.82 dyne/cm, confirming good adhesion of the film and the substrate. A pattern was lithographically transferred through the masking material on the silicon substrate, and the etch rate of the masking layer was calculated from the masking time data of the films. The etch rate value of 4 Å /min obtained for the masking material is low compared to the etch rate of the conventional masking materials (60 Å /min for SiO 2 and 8 Å /min for Si 3 N 4 ).

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Structural characterization of sputtered PMMA in argon plasma

Cited by 17 publications

References 14 publications

Novel polymers based on atom transfer radical polymerization of 2‐methoxyethyl acrylate

Novel polymers based on atom transfer radical polymerization of 2‐methoxyethyl acrylate

Effect of plasma fluorination variables on the deposition and growth of partially fluorinated polymer over PMMA films

Poly(methyl methacrylate) as masking material for microelectromechanical system (MEMS) fabrication

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