2005
DOI: 10.1016/j.tsf.2004.06.141
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Structural, electric and kinetic parameters of ternary alloys of GeSbTe

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Cited by 90 publications
(47 citation statements)
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“…It is well known from the literature that deposition technology strongly affects the microstructure and as a results the optical, electrical and crystallization (especially the crystallization temperature) properties of phase-change materials. For example, the crystallization temperature of the films with the same composition but obtained by different deposition methods can differ for more than 20 0 C, and no suitable explanation has yet been proposed (Morales-Sanchez et al, 2005). That is why, to compare crystallization properties all studied films have to be obtained with the same deposition process (DC sputtering), with the same thickness (around 200 nm), and composition along the GeTe-Sb 2 Te 3 pseudobinary line.…”
Section: Deposition Of Phase Change Filmsmentioning
confidence: 99%
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“…It is well known from the literature that deposition technology strongly affects the microstructure and as a results the optical, electrical and crystallization (especially the crystallization temperature) properties of phase-change materials. For example, the crystallization temperature of the films with the same composition but obtained by different deposition methods can differ for more than 20 0 C, and no suitable explanation has yet been proposed (Morales-Sanchez et al, 2005). That is why, to compare crystallization properties all studied films have to be obtained with the same deposition process (DC sputtering), with the same thickness (around 200 nm), and composition along the GeTe-Sb 2 Te 3 pseudobinary line.…”
Section: Deposition Of Phase Change Filmsmentioning
confidence: 99%
“…This alloy crystallizes in NaCl-type structure (Gonzalez-Hernandez et al, 1992, Wamwangi et al, 2002, Ruiz Santos et al, 2010. For Ge 4 Sb 1 Te 5 films the reported values of the activation energy varied in a wide range: 1.13 eV (Kato et al, 1999), 3.09 eV (Morales-Sanchez et al, 2005), 3.48 eV (Wamwangi et al, 2002).…”
Section: Crystallization Of Ge 4 Sb 1 Tementioning
confidence: 99%
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“…The small heat rate limit corresponds to ramped annealing measurements that are used to characterize phase-change media ͑for example, resistance measurements, 6,29 and differential scanning calorimetry 14 ͒, while the high heating rate regime simulates the situation of laser recording in optical storage.…”
Section: ͑19͒mentioning
confidence: 99%
“…13,17 It also explains why the use of the Kissinger method for determining the kinetic parameters of crystallization in phase-change media is appropriate in thermal annealing experiments adopted by many workers. 6,15,16,29 The transition temperature is identified as the temperature of maximum crystallization rate 12 at which ‫ץ‬ 2 / ‫ץ‬t 2 =0. Thus, differentiating ͑21͒ with respect to time and assuming that A does not change significantly near the maximum, 13 leads to the following condition at the transition temperature:…”
Section: Small Heating Ratesmentioning
confidence: 99%