2008
DOI: 10.1016/j.solmat.2007.11.002
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Structural, electrical and photovoltaic characterization of Si nanocrystals embedded SiC matrix and Si nanocrystals/c-Si heterojunction devices

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Cited by 122 publications
(65 citation statements)
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“…In addition, co-crystallization of Si and SiC NC is observed [22][23][24][25][26]. It was only recently that Summonte et al [12] managed to obtain size-controlled Si NC in SiC by optimizing the ML parameters: they proved using transmission electron microscope (TEM) images that for an as-deposited SRC thickness between 3 and 4 nm, the ML structure survives the annealing for both 3 nm and 9 nm thick SiC barrier layers.…”
Section: Page 5 Of 27mentioning
confidence: 99%
“…In addition, co-crystallization of Si and SiC NC is observed [22][23][24][25][26]. It was only recently that Summonte et al [12] managed to obtain size-controlled Si NC in SiC by optimizing the ML parameters: they proved using transmission electron microscope (TEM) images that for an as-deposited SRC thickness between 3 and 4 nm, the ML structure survives the annealing for both 3 nm and 9 nm thick SiC barrier layers.…”
Section: Page 5 Of 27mentioning
confidence: 99%
“…For example, it was reported that, by using p-type nc-Si:SiC films to get hetero-junction solar cells with n-type crystalline-Si (c-Si), the spectral response in the visible light range can be enhanced compared with that of conventional c-Si p-n junction solar cells. 7 Moreover, an intense visible light emission from nc-Si:SiC films deposited using advanced electron-cyclotron-resonance chemical vapor deposition (ECRCVD) technique was also observed at room temperature under laser excitation. 8 X. Xu et al used laser crystallization technique to get the p-i-n structures containing nc-Si:SiC films and they observed the improved electroluminescence due to the enhanced radiative recombination probability.…”
Section: Introductionmentioning
confidence: 99%
“…9 Usually, nc-Si:SiC films can be obtained by growing Si-rich SiC films or amorphous Si/SiC multilayers with subsequently thermal annealing at high temperature. [5][6][7][8][9][10][11][12] By controlling the Si/C ratio or the post-annealing conditions, the optical band gap can be tunable which brings convenience to the design of optoelectronic devices. However, the SiC matrix with a large band gap usually has a poor conductive property and in turn impedes the carrier transport process which will deteriorate the device performance.…”
Section: Introductionmentioning
confidence: 99%
“…As a rule of thumb, greater silicon excess, higher annealing temperature, and longer annealing produce larger and more crystallized Si-ncs. The phase separation mechanism is also valid for the fabrication of Si-nc embedded in silicon nitride [75]- [77] and silicon carbide [78].…”
Section: Si-nc Based Light Emittersmentioning
confidence: 79%