Structural evolution of Ti destroyable interlayer in large-size diamond film deposition by DC arc plasma jet

Guo, Jenhwa; Li, Chengming; Liu, Jinlong; Wei, Junjun; Chen, Liangxian; Hua, Chenyi; Yan, Xiongbo

doi:10.1016/j.apsusc.2016.02.158

Cited by 10 publications

(3 citation statements)

References 21 publications

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“…This leads to a non-stationary flux of carbon to the plasma and gradual improvement of the diamond quality. The use of graphite as the solid carbon source can be used to deposit continuous diamond films on separate non-carbon substrates [11][12][13][14][15][16], while such films on graphite could be grown using interlayer resistant to hydrogen plasma etching, as demonstrated for Ti interlayer on graphite in case of DC arc jet diamond deposition [34][35].…”

Section: Discussionmentioning

confidence: 99%

Diamond Deposition on Graphite in Hydrogen Microwave Plasma

Zhu

Yao

Dai

et al. 2018

J. Coat. Sci. Technol.

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Hydrogen plasma etching of graphite generates radicals that can be used for diamond synthesis by chemical vapor deposition (CVD). We studied the etching of polycrystalline graphite by a hydrogen microwave plasma, growth of diamond particles of the non-seeded graphite substrates, and characterized the diamond morphology, grain size distribution, growth rate, and phase purity. The graphite substrates served simultaneously as a carbon source, this being the specific feature of the process. A disorder of the graphite surface structure reduces as the result of the etching as revealed with Raman spectroscopy. The diamond growth rate of 3-5 µm/h was achieved, the quality of the produced diamond grains improving with growth time due to inherently nonstationary graphite etching process.

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Section: Discussionmentioning

confidence: 99%

Diamond Deposition on Graphite in Hydrogen Microwave Plasma

Zhu

Yao

Dai

et al. 2018

J. Coat. Sci. Technol.

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“…Recently, the demand for large diamond films has increased [1][2][3]. Hot filament chemical vapour deposition (CVD) and DC arc plasma jet CVD are two frequently used CVD techniques already employed in industrial production [4][5][6][7]. However, microwave plasma chemical vapour deposition (MPCVD) technique that can deposit high-quality diamond films is still under continuous development with respect to the preparation technology of large-sized diamond films.…”

Section: Introductionmentioning

confidence: 99%

Effects of the electric field at the edge of a substrate to deposit a Ø100 mm uniform diamond film in a 2.45 GHz MPCVD system

Zhang

Shao

et al. 2022

Plasma Sci. Technol.

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In this study, uniform diamond films with a diameter of 100 mm were deposited in a 15 kW/2.45 GHz ellipsoidal microwave plasma chemical vapour deposition (MPCVD) system. A phenomenological model previously developed by our group was used to simulate the distribution of the electric strength and electron density of plasma. Results indicate that the electric field in the cavity includes multiple modes, i.e. TM02 and TM03. When the gas pressure exceeds 10 kPa, the electron density of plasma increases and plasma volume decreases. A T-shaped substrate was developed to achieve uniform temperature, and the substrate was suspended in air from Ø70 mm to 100 mm, thus eliminating vertical heat dissipation. An edge electric field was added to the system after the introduction of the T-shaped substrate. Moreover, the plasma volume in this case was greater than that in the central electric field but smaller than that in the periphery electric field of the TM02 mode. This indicates that the electric field above and below the edge benefits the plasma volume rather than the periphery electric field of the TM02 mode. The quality, uniformity and surface morphology of the deposited diamond films were primarily investigated to maintain substrate temperature uniformity. When employing the improved substrate, the thickness unevenness of the Ø100 mm diamond film decreased from 22% to 7%.

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“…Plasma jets are common methods of SiO 2 deposition because of their ease of operation, simple system, and low cost [14,15]. Substrate heating is always used to improve the coating's properties of adhesion and hardness [16,17]. In order to deposit on resin composite and teeth in situ, a plasma jet is needed that will operate with a low temperature plume and without substrate heating.…”

Section: Introductionmentioning

confidence: 99%

Deposition of stain resistance coating by non-thermal plasma brush application to dental whitening

Dong

2019

Plasma Sci. Technol.

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A non-thermal plasma brush is employed to deposit stain-resistant SiO 2 -like coatings on resin composite fillings and bovine teeth. With post-treating by plasma, the hardness of the coating increases from H to 8H and the water contact angle decreases from 98.8°to 61.7°. The Fourier transform infrared spectroscopy (FTIR) results show that, after plasma post-treating, the Si-O-Si and Si-OH bonds of the coating increase. Scanning electron microscope (SEM) images show the coatings to be uniform, without cracks. The coatings present outstanding performance in a stain resistance test both on resin composite and bovine teeth. Being easy to handle and less time consuming than traditional methods, with a body-friendly temperature and material, this plasma brush provides a promising in-situ coating method on patient teeth in dental clinics.

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Structural evolution of Ti destroyable interlayer in large-size diamond film deposition by DC arc plasma jet

Cited by 10 publications

References 21 publications

Diamond Deposition on Graphite in Hydrogen Microwave Plasma

Diamond Deposition on Graphite in Hydrogen Microwave Plasma

Effects of the electric field at the edge of a substrate to deposit a Ø100 mm uniform diamond film in a 2.45 GHz MPCVD system

Deposition of stain resistance coating by non-thermal plasma brush application to dental whitening

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