Structural, magnetic and transport properties of ion beam deposited Co thin films

Fermento, R.; Leitao, Diana C.; Teixeira, João Marques; Pereira, A. M.; Carpinteiro, F.; Ventura, J.; Araújo, João P.; Sousa, J.B.

doi:10.1016/j.jnoncrysol.2008.05.077

Cited by 15 publications

(8 citation statements)

References 19 publications

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“…Figure 7(a) shows the room temperature ρ * (t) dependence for the nanohole array samples. Initially, ρ * (t) has a similar trend to the continuous thin films, decreasing rapidly as t increases (inset of figure 7(a)) [28,42]. However, a minimum is visible around t 50 nm, which is close to our extrapolated thickness for the closure of the nanopores (figure 2(a)).…”

Section: Discussionsupporting

confidence: 75%

“…On top of the AAO we deposited a NiFe (80:20) thin film using a 1160L four-target ion-beam deposition (IBD) system from Commonwealth Scientific Corporation with a base pressure of ∼8 × 10 −7 Torr [28]. A beam voltage of 1000 V and a beam current of 15 mA were used, giving a NiFe deposition rate of 0.035 nm s −1 for an Ar flow of 5 sccm with the working pressure of ∼2 × 10 −4 Torr.…”

Section: Methodsmentioning

confidence: 99%

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Correlations among magnetic, electrical and magneto-transport properties of NiFe nanohole arrays

Leitao

Ventura

Teixeira

et al. 2013

J. Phys.: Condens. Matter

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In this work, we use anodic aluminum oxide (AAO) templates to build NiFe magnetic nanohole arrays. We perform a thorough study of their magnetic, electrical and magneto-transport properties (including the resistance R(T), and magnetoresistance MR(T)), enabling us to infer the nanohole film morphology, and the evolution from granular to continuous film with increasing thickness. In fact, different physical behaviors were observed to occur in the thickness range of the study (2 nm < t < 100 nm). For t < 10 nm, an insulator-to-metallic crossover was visible in R(T), pointing to a granular film morphology, and thus being consistent with the presence of electron tunneling mechanisms in the magnetoresistance. Then, for 10 nm < t < 50 nm a metallic R(T) allied with a larger anisotropic magnetoresistance suggests the onset of morphological percolation of the granular film. Finally, for t > 50 nm, a metallic R(T) and only anisotropic magnetoresistance behavior were obtained, characteristic of a continuous thin film. Therefore, by combining simple low-cost bottom-up (templates) and top-down (sputtering deposition) techniques, we are able to obtain customized magnetic nanostructures with well-controlled physical properties, showing nanohole diameters smaller than 35 nm.

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Section: Discussionsupporting

confidence: 75%

Section: Methodsmentioning

confidence: 99%

Correlations among magnetic, electrical and magneto-transport properties of NiFe nanohole arrays

Leitao

Ventura

Teixeira

et al. 2013

J. Phys.: Condens. Matter

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“…As a result, higher partial pressures and growth rates are achievable. In contrast to conventional film fabrication methods, [18] the rate-determining step is surface kinetics and mass diffusion rather than feed rate-limited deposition. Furthermore, the contingencies of catalytic decomposition of the precursor due to metal Full Paper deposition inside the evaporation zone, and of unfavorable gas phase reactions prior to deposition, are diminished.…”

Section: Discussionmentioning

confidence: 99%

Effects of MOCVD Thin Cobalt Films' Structure and Surface Characteristics on their Magnetic Behavior

Papadopoulos

Karayianni

Tsakiridis

et al. 2011

Chemical Vapor Deposition

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Cobalt thin films are deposited by metal-organic (MO)CVD, under various experimental conditions, on Si and SiO 2 substrates. The precursors used are cobalt nitrosyl tricarbonyl, Co(CO) 3 NO, cobalt acetylacetonate, Co(acac) 2 , and cobalt carbonyl, Co 2 (CO) 8 . Emphasis is given to the delivery method of each precursor, especially to a new technique of aerosol delivery. The films are thoroughly examined in terms of microstructure and surface morphology in order to establish relevance to magnetic properties. It is found that Co films deposited from Co 2 (CO) 8 dissolved in dichloromethane are characterized by a high degree of planarity and purity, while exhibiting a non-hysteretic giant magnetoresistance (GMR) behavior in the presence of an externally applied magnetic field normal to their surface.

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“…Films consisting of ten Fe-V bilayers with a total thickness of 20 nm were prepared onto the native oxide layer of Si(100) substrates by pulsed laser deposition (PLD) and ionbeam deposition (IBD) [21]. PLD experiments were carried out with an excimer laser (wavelength of 248 nm, pulse duration of 30 ns) operating at a pulse repetition rate of 10 Hz.…”

Section: Methodsmentioning

confidence: 99%

Laser-induced diffusion decomposition in Fe–V thin-film alloys

Polushkin

Duarte

Conde

et al. 2015

Applied Surface Science

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Structural, magnetic and transport properties of ion beam deposited Co thin films

Cited by 15 publications

References 19 publications

Correlations among magnetic, electrical and magneto-transport properties of NiFe nanohole arrays

Correlations among magnetic, electrical and magneto-transport properties of NiFe nanohole arrays

Effects of MOCVD Thin Cobalt Films' Structure and Surface Characteristics on their Magnetic Behavior

Laser-induced diffusion decomposition in Fe–V thin-film alloys

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