Structural, Optical, and Electrical Characteristics of Zinc Oxide and Copper Oxide Films and Their Heterojunctions

Abstract

In this paper, n-Zinc oxide=p-copper oxide heterojunctions were fabricated by RF-sputtering on indium tin oxide-covered glass substrates. The structural and optical properties of the copper oxide and zinc oxide films were analyzed by X-ray diffraction, Fourier transform infrared, scanning electronic microscopy and ultraviolet-visible spectroscopy. The electrical junction properties were investigated by current-voltage (I-V) characteristics. Additionally, both capacitance (C) and conductance (G) versus frequency ( f ) measurements were realized at room temperature. The junctions showed a rectifying behavior, and C and G varied with both voltage and frequency.

Structural, optical and electrical properties of Aluminum doped ZnO, CuO and their heterojunction fabricated using spin coating and Rf-Sputtering techniques

“…The obtained lattice parameters for the CuO thin films are summarized in Table 1 . It is noticed that these parameters are in close agreement with previous reported values (11) , (35) . In addition, the crystallite size D of the films was determined from the Debye Scherrer equation given by (41) : https://www.indjst.org/…”

“…Other details concerning the determination of the optical parameters from the optical transmission spectrum were reported by Laaziz et al (45) . The optical gap of ZnO thin films was found to be 3.27 eV, which is in agreement with the reported value (Eg= 3.28 eV) (35) , (46) , (47) . On the other hand, the optical band gap of CuO is found to be 1.58 eV, which is also consistent with previously reported values for CuO (35) , (48) .…”

“…No characteristic peaks of aluminum oxide or of any impurities were observed. In addition, no preferred growth direction is observed compared to the thin films deposited by RF-sputtering which exhibited a (100) preferred orientation on glass substrates as reported elsewhere (35) .…”

“…Vacuum processing of the junction, through reactive RF-sputtering of CuO on pre-fabricated and cleaned ZnO films may minimize such problems and also allow to control the oxide structure and stoichiometric easily. In our previous work, we based only on Rf-sputtering technique to fabricate CuO/ZnO heterojunction (35) . In this work, we proposed to synthesize CuO and Aluminum doped ZnO thin films by the two different techniques RF-sputtering and spin coating respectively.…”

Effect of Precursor Solvents on the Optical Properties of Copper Oxide Thin Films Deposited Using Spray Pyrolysis for Optoelectronic Applications

“…Functional thin films such as oxides, sulphides, nitrides and oxynitride are synthesized using different deposition techniques among which are thermal evaporation [14][15][16], chemical bath methods [17][18], sputtering [19][20][21][22][23], electroplating [24] electrodeposition [25], pulsed laser deposition [26], sol-gel [27][28][29], successive ionic layer adsorption and reaction (SILAR) [30] and spray pyrolysis [31][32][33][34][35][36]. Some of these methods have been employed to produce single oxide Cu x O thin films and among these methods, spray pyrolysis has been proven to be simple, cheap and fast to scale-up.…”