2015
DOI: 10.1016/j.ijleo.2015.02.047
|View full text |Cite
|
Sign up to set email alerts
|

Structural, optical and electrical properties of amorphous carbon films deposited by pulsed unbalanced magnetron sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

1
13
0

Year Published

2016
2016
2021
2021

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 21 publications
(14 citation statements)
references
References 18 publications
1
13
0
Order By: Relevance
“…Figure 7 depicts the measurement results of the optical band gap and the relationships with the sp 3 ratio of NEXAFS (a) and hydrogen content (b). The optical band gap is plotted between 0.17 and 1.78 eV, in good agreement with 1.5–1.9 eV [ 87 ] and 1.6–2.1 eV [ 88 ] in the previous study. The correlation coefficients were 0.258 and 0.402, respectively.…”
Section: Analysis and Testing Resultssupporting
confidence: 86%
“…Figure 7 depicts the measurement results of the optical band gap and the relationships with the sp 3 ratio of NEXAFS (a) and hydrogen content (b). The optical band gap is plotted between 0.17 and 1.78 eV, in good agreement with 1.5–1.9 eV [ 87 ] and 1.6–2.1 eV [ 88 ] in the previous study. The correlation coefficients were 0.258 and 0.402, respectively.…”
Section: Analysis and Testing Resultssupporting
confidence: 86%
“…Besides, the continuous bombardment can also cause the heating effect on the film/substrate which is beneficial to the formation of sp 2 clusters and grain coarsening, leading to the higher surface roughness [47,48]. Chen et al [46] and Laugier et al [49] also reported with the increase of temperature the sp 2 content in amorphous carbon films by magnetron sputtering firstly decreased and then increased when the temperature improved to a critical value. Thus, the increase of sp 2 content, grain size and surface roughness can be attributed to the synergistic effects of the higher mobility of the deposited atoms and heating effects with the extension of deposition time.…”
Section: The Microstructure Evolution Of Glc Filmsmentioning
confidence: 98%
“…Although the extra energy carried by the implanted C + may be beneficial to the transformation from sp 2 to sp 3 at relative lower energy range, thermalization and relaxation can take place at higher energies allowing the excess density to relax to zero, and cause a loss of sp 3 bonding at higher ion energies [46]. Meanwhile, the deposition rate increased with the relaxation of the subplanted carbon atoms to the surface with the rise of the deposition time.…”
Section: The Microstructure Evolution Of Glc Filmsmentioning
confidence: 99%
“…Magnetron sputtering (MS) is one of the most common methods to fabricate a variety of thin films with specific properties appropriate for industrial applications [1][2][3][4][5][6][7]. Unbalanced magnetron sputtering (UMS) and closed field unbalanced magnetron sputtering (CFUMS) are a step forward of classical MS in which they provide higher deposition rate, denser and more spacious plasma expanded to the substrate while the quality of thin films is also enhanced [6,8,9]. The enhancement of thin films quality is strongly connected to the ratio of the ion to atom transported into the substrate [10,11], in which they not only have enough kinetic energy to be located on the thermodynamically lower energy place but also they can kick off loosely bonded atoms from the substrate surface, providing the negative bias voltage is applied.…”
Section: Introductionmentioning
confidence: 99%