Structural, optical and ellipsometric characteristics of PVD synthesized SnO2 thin films on Pt coated silicon wafers

Howari, Haidar; Tomsah, I.B.I.

doi:10.1016/j.ijleo.2017.05.098

Cited by 10 publications

(4 citation statements)

References 13 publications

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“…Compared to the literature using MSD [ 2 , 3 ], sol–gel [ 10 ], CVD [ 44 ], and thermal ALD [ 19 , 20 , 21 ], PEALD possess a great ability to deposit high-quality SnO 2 thin films. The refractive indices of SnO 2 thin films prepared by MSD, thermal evaporation and sol–gel process are 1.96, 2.12, and 2.07, respectively, at the wavelength of around 600 nm [ 4 , 5 , 10 ]. These values are similar to the values in the present study.…”

Section: Resultsmentioning

confidence: 99%

“…In the past few decades, tin oxide (SnO 2 ), as a promising semiconductor material, has gained significant attention due to the excellent photoelectric properties, such as high transparency, suitable band gap and band structure, and superior electron mobility. In recent works, there are abundant techniques to prepare the SnO 2 thin films, including magnetron sputter deposition (MSD) [ 1 , 2 , 3 , 4 ], thermal evaporation [ 5 ], spray pyrolysis deposition [ 6 , 7 ], sol–gel process [ 8 , 9 , 10 , 11 ], and chemical vapor deposition (CVD) [ 12 , 13 , 14 , 15 ]. However, these technologies still have many shortcomings such as poor coverage, presence of pinholes, and the uncontrolled defects.…”

Section: Introductionmentioning

confidence: 99%

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Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition

et al. 2021

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In this study, the effect of radical intensity on the deposition mechanism, optical, and electrical properties of tin oxide (SnO2) thin films is investigated. The SnO2 thin films are prepared by plasma-enhanced atomic layer deposition with different plasma power from 1000 to 3000 W. The experimental results show that plasma contains different amount of argon radicals (Ar*) and oxygen radicals (O*) with the increased power. The three deposition mechanisms are indicated by the variation of Ar* and O* intensities evidenced by optical emission spectroscopy. The adequate intensities of Ar* and O* are obtained by the power of 1500 W, inducing the highest oxygen vacancies (OV) ratio, the narrowest band gap, and the densest film structure. The refractive index and optical loss increase with the plasma power, possibly owing to the increased film density. According to the Hall effect measurement results, the improved plasma power from 1000 to 1500 W enhances the carrier concentration due to the enlargement of OV ratio, while the plasma powers higher than 1500 W further cause the removal of OV and the significant bombardment from Ar*, leading to the increase of resistivity.

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Section: Resultsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition

et al. 2021

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“…Removal of (Cd and Pb) from aqueous solution was studied as function of pH in the range of (3)(4)(5)(6)(7)(8)(9)(10)(11) at (25) ppm concentration, contact time 30 mint, at room temperature. Figure 6 shows the effect of pH values on the adsorption of both of Cd and Pb using the prepared SnO 2 nanoparticles as adsorbents.…”

Section: Effect Of Ph Valuesmentioning

confidence: 99%

“…Tin oxide (SnO 2 ) is consider one of the most nanoparticles to be inspected recently; SnO 2 nanoparticles is a n-type semiconductor, which could be used in various applications such as in solid-state gas sensors [21], transparent conducting electrodes [22], rechargeable Li batteries [23,24], and optical electronic devices [25], and as pollutant adsorbent, such as; heavy metal ions and dyes [26,27], however the available literature on adsorption of heavy metal ions by Tin oxide nanoparticles is limited.…”

Section: Introductionmentioning

confidence: 99%

Facile Preparation of Copper and Tin Oxide Nanoparticles as Efficient Adsorbent of Heavy Metals from Wastewater

Abdelaal¹,

Abdelmotaleb²,

Kady³

et al. 2021

IJEE

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Heavy metal removal from waste water is essential to solve the global water crises. Transition metal oxide nanoparticles are promising candidates for these applications. Herein, Copper oxide and Tin oxide nanoparticles have been prepared via Facile and economic perception method starting from commercial precursors. The obtained nanoparticles were in flack-like shape and spherical shape for Copper oxide and Tin oxide nanoparticles, respectively. All prepared nanoparticles are in crystalline phases, where the prepared Copper oxide and Tin oxide nanoparticles were in monoclinic and tetragonal crystalline phases, respectively. The crystal size of Copper oxide and Tin oxide nanoparticles were 12 nm and 13 nm respectively. Cd and Pb ions were removed from wastewater by the obtained Copper oxide and Tin oxide nanoparticles. The adsorption processes were studied under various parameters, such as; contact time and pH values. The highest removal uptake was about ~99% of Pb ions were recorded for Copper oxide nanoparticles. This uptake process carried out after 30 min in a neutral medium (pH 7). While, Tin oxide nanoparticles removed about ~94% at the same conditions. On the other hand, Copper oxide nanoparticles removed about ~ 57% from Cd ions. This uptake process carried out after 30 min in a partially acidic medium (pH 6). While, Tin oxide nanoparticles removed about ~54% at the same conditions. Finally, it is highly recommended to use Copper oxide and Tin oxide nanoparticles as promising adsorbents for heavy metal removal applications.

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Impedometric humidity sensing characteristics of SnO2 thin films and SnO2–ZnO composite thin films grown by magnetron sputtering

Velumani

Meher

Alex

2017

J Mater Sci: Mater Electron

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Structural, optical and ellipsometric characteristics of PVD synthesized SnO2 thin films on Pt coated silicon wafers

Cited by 10 publications

References 13 publications

Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition

Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition

Facile Preparation of Copper and Tin Oxide Nanoparticles as Efficient Adsorbent of Heavy Metals from Wastewater

Impedometric humidity sensing characteristics of SnO2 thin films and SnO2–ZnO composite thin films grown by magnetron sputtering

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