1998
DOI: 10.1016/s0040-6090(97)01181-4
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Structural properties of electrodeposited Co/Cu multilayers

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Cited by 28 publications
(23 citation statements)
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“…By looking at former reports, [5][6][7][8][9][10][11][12][13][14][15] it can be established that in most cases not completely systematic studies on layer thicknesses have been carried out for ED Co/Cu multilayers from the sulfate bath. For example, there were several studies of the GMR dependence on layer thicknesses, where one of the layer thicknesses was fixed and the other layer thickness was only varied.…”
mentioning
confidence: 99%
“…By looking at former reports, [5][6][7][8][9][10][11][12][13][14][15] it can be established that in most cases not completely systematic studies on layer thicknesses have been carried out for ED Co/Cu multilayers from the sulfate bath. For example, there were several studies of the GMR dependence on layer thicknesses, where one of the layer thicknesses was fixed and the other layer thickness was only varied.…”
mentioning
confidence: 99%
“…This electrode was introduced into the cell, filled with a deaerated solution [28,31,33]. The electrolyte composition was chosen in order to control hydrogen evolution during the cyclic voltammetry: too low pH electrolyte would lead to hydrogen evolution before metal deposition [34].…”
Section: Determination Of Potentials Reduction and Oxidation Of The Cmentioning
confidence: 99%
“…The literature mentioned that pH around 4 was the best for Co electrodeposition onto metal substrate [31,35]. To maintain this pH value, boric acid was frequently used as a buffer agent [28,31,33,35,36].…”
Section: Determination Of Potentials Reduction and Oxidation Of The Cmentioning
confidence: 99%
“…r Electrochemical deposition technique for multilayer in which the magnetic layer is a binary alloy has not been extensively used even if certain properties offered by this technique can be comparable to those of others techniques [1]. It has been previously shown that the magnetoresistance of electrodeposited Co/Cu multilayers is comparable to the sputtered and MBE grown Co/Cu samples and a small antiferromagnetic coupling between magnetic layers give rise to a relatively high magnetoresistance [2].The aim of this work was to produce electrodeposited (Co x Zn 1Àx /Cu) n multilayers not studied until now and to investigate the structural, the magnetic and the transport properties.The (Co x Zn 1Àx /Cu) multilayers have been grown using the electrodeposition technique by the dual bath. The magnetic Co x Zn 1Àx layer was deposited in the electrolyte bath containing CoCl 2 Á 6H 2 O; CoSO 4 Á 7H2O; ZnSO 4 Á 7H 2 O; (NH 4 ) 2 SO 4 and H 3 BO 3 .…”
mentioning
confidence: 99%
“…r Electrochemical deposition technique for multilayer in which the magnetic layer is a binary alloy has not been extensively used even if certain properties offered by this technique can be comparable to those of others techniques [1]. It has been previously shown that the magnetoresistance of electrodeposited Co/Cu multilayers is comparable to the sputtered and MBE grown Co/Cu samples and a small antiferromagnetic coupling between magnetic layers give rise to a relatively high magnetoresistance [2].…”
mentioning
confidence: 99%