Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering

Zywitzki, O.; Modes, T.; Sahm, Hagen; Frach, Peter; Goedicke, K.; Glöß, Daniel

doi:10.1016/j.surfcoat.2003.10.115

Cited by 127 publications

(64 citation statements)

References 18 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…This is almost three times higher than that of the 304 L stainless steel substrate (6.9 GPa). This is also significantly higher than the 8 GPa reported for anatase films [10]. This TiO 1.5 N 0.5 CVD coating (1 μm thick) is as hard if not more than as those (400 nm thick) deposited by d.c. reactive sputtering (16.5 GPa) [11].…”

Section: Mechanical Properties Of Dense and Amorphous Tio X N Y Coatingsmentioning

confidence: 58%

See 1 more Smart Citation

TiOxNy coatings grown by atmospheric pressure metal organic chemical vapor deposition

Maury

Duminica

2010

Surface and Coatings Technology

View full text Add to dashboard Cite

, Florin-Daniel Duminica. TiOxNy coatings grown by atmospheric pressure metal organic chemical vapor deposition. Surface and Coatings Technology, Elsevier, 2010, vol. 205, pp. 1287-1293. 10.1016/j.surfcoat.2010 Open Archive TOULOUSE Archive Ouverte (OATAO)OATAO is an open access repository that collects the work of Toulouse researchers and makes it freely available over the web where possible. Any correspondance concerning this service should be sent to the repository administrator: staff-oatao@inp-toulouse.fr. Titanium oxynitride coatings were deposited on various substrates by an original atmospheric pressure metal organic chemical vapor deposition (MOCVD) process using titanium tetra-iso-propoxide as titanium and oxygen precursors and hydrazine as a nitrogen source. The films composition was monitored by controlling the N 2 H 4 mole fraction in the initial reactive gas phase. The variation of the N content in the films results in significant changes in morphological, structural and mechanical properties. When a large excess of the nitrogen source is used the resulting film contains ca 17 at % of nitrogen and forms dense and amorphous TiO x N y films. Growth rates of these amorphous TiO 1.5 N 0.5 coatings as high as 14 μm/h were obtained under atmospheric pressure. The influence of the deposition conditions on the morphology, the structure, the composition and the growth rate of the films is presented. For the particular conditions leading to the growth of amorphous TiO 1.5 N 0.5 coatings, first studies on the mechanical properties of samples grown on stainless steel have revealed a high hardness, a low friction coefficient, and a good wear resistance in unlubricated sliding experiments against alumina which make them very attractive as protective metallurgical coatings.

show abstract

Section: Mechanical Properties Of Dense and Amorphous Tio X N Y Coatingsmentioning

confidence: 58%

“…For instance, N-doped TiO 2 exhibits photocatalytic activity in the visible light [8,9] that is insignificant for TiO 2 . On the other hand, the hardness of anatase is typically 8 GPa [10] while it increases for instance to 16.5 GPa for TiO x N y PVD coatings [11].…”

Section: Introductionmentioning

confidence: 99%

TiOxNy coatings grown by atmospheric pressure metal organic chemical vapor deposition

Maury

Duminica

2010

Surface and Coatings Technology

View full text Add to dashboard Cite

show abstract

“…4a, b), which is harder and more wear resistance than anatase. Previous results obtained by reactive pulse magnetron sputtering have shown that anatase phase has a hardness between 6 and 8 GPa, while rutile phase is linked with a drastic increase of hardness values up to 17 GPa [85,86]. For rutile layers deposited by Spotless arc Activated Deposition, hardness values up to 12 GPa could be determined by Modes et al [86].…”

Section: Wear Track Analysismentioning

confidence: 93%

Tribocorrosion Behavior of Calcium- and Phosphorous-Enriched Titanium Oxide Films and Study of Osteoblast Interactions for Dental Implants

et al. 2015

View full text Add to dashboard Cite

Titanium (Ti) dental implants are frequently exposed simultaneously to a corrosive environment and cyclic micromovements at implant/abutment and implant/ bone interfaces, becoming part of a tribocorrosion system. Thus, wear debris and corrosion products/ions can be released to peri-implant tissues and induce inflammatory reactions leading to implant failure. Moreover, the poor osseointegration is also one of the main problems affecting dental implants lifetime. Surface modification strategies have been proposed to design novel Ti oxide-based multifunctional surfaces that are able to simultaneously improve cellular functions and provide enhanced tribocorrosion resistance. Hence, the main objective of this work was the synthesis of Calcium (Ca)-and Phosphorous (P)-enriched Ti oxide films aimed to display superior wear/corrosion performance and simultaneously, to enhance osteoblast-material interactions. Ca-and P-enriched films were synthesized by plasma electrolytic oxidation (PEO) and their characteristics were assessed by Field emission scanning electron microscopy, profilometry, energy-dispersive X-ray spectroscopy, X-ray diffraction, and water contact angle measurements. PEO-treated samples were subjected to pin-on-disk reciprocating sliding tests in artificial saliva at 37°C. The viability of MG63 cells cultured on PEO-treated samples was investigated by MTT assay, and their adhesion ability by SEM and confocal laser scanning microscopy. The wear/corrosion behavior of Ti was improved after PEO treatments and the electrolyte composition appeared to play a crucial role both on its corrosion tendency and mechanical wear resistance. It is believed that this improvement is related to the higher rutile/anatase ratio exhibited by Ca-and P-enriched surfaces. Osteoblasts were well spread on these surfaces displaying improved viability/proliferation compared to Ti.

show abstract

“…Titania thin films can be prepared by various physical vapor deposition techniques, e.g. evaporation [12,13], reactive radiofrequency magnetron sputtering [14][15][16][17], reactive pulse magnetron sputtering [18], high power impulse magnetron sputtering [19,20], arc deposition [21] or laser deposition [22]. In the literature several reports can be found regarding the hardness of titanium dioxide thin films.…”

Section: Introductionmentioning

confidence: 99%

Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

Wojcieszak

Mazur

Indyka

et al. 2015

Materials Science-Poland

View full text Add to dashboard Cite

Titanium dioxide thin films were prepared using two types of magnetron sputtering processes: conventional and with modulated plasma. The films were deposited on SiO 2 and Si substrates. X-ray diffraction measurements of prepared coatings revealed that the films prepared using both methods were nanocrystalline. However, the coatings deposited using conventional magnetron sputtering had anatase structure, while application of sputtering with modulated plasma made possible to obtain films with rutile phase. Investigations performed with the aid of scanning electron microscope showed significant difference in the surface morphology as well as the microstructure at the thin film cross-sections. The mechanical properties of the obtained coatings were determined on the basis of nanoindentation and abrasion resistance tests. The hardness was much higher for the films with the rutile structure, while the scratch resistance was similar in both cases. Optical properties were evaluated on the basis of transmittance measurements and showed that both coatings were well transparent in a visible wavelength range. Refractive index and extinction coefficient were higher for TiO 2 with rutile structure.

show abstract

Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering

Cited by 127 publications

References 18 publications

TiOxNy coatings grown by atmospheric pressure metal organic chemical vapor deposition

TiOxNy coatings grown by atmospheric pressure metal organic chemical vapor deposition

Tribocorrosion Behavior of Calcium- and Phosphorous-Enriched Titanium Oxide Films and Study of Osteoblast Interactions for Dental Implants

Mechanical and structural properties of titanium dioxide deposited by innovative magnetron sputtering process

Contact Info

Product

Resources

About