Structure and Tribological Behaviors of Synthetic MoS₂ Film Prepared by a Novel Compound Method

Abstract

In this paper, the structure and tribological properties of synthetic MoS2 film prepared by a novel compound technology—combining magnetron sputtering with low temperature ion sulfurizing were investigated. X-ray diffraction (XRD) pattern for the MoS2 film implies that the film mainly consists of Mo and MoS2 phases. The hardness of the synthetic MoS2 film was 7.44 GPa which was higher than that of the FeS film. The sliding tribological behavior of the MoS2 film was studied by ball-on-disc tests. The results showed that the synthetic MoS2 film possessed excellent friction-reducing and wear-resisting properties. In addition, the tribological behaviors of the MoS2 film were superior to those of the FeS film and original 1045 steel.