Structure Control in Reactively Sputtered Ag/Cu/(Mn)/O Films

Pierson, J.F.; Petitjean, Carine; Horwat, David

doi:10.1002/ppap.200930001

Cited by 8 publications

(3 citation statements)

References 60 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Pititjean et al [9] reported on the influence of annealing temperature on the decomposition, and structural and properties relationship in reactively sputtered Ag 2 Cu 2 O 3 films formed with Ag 50 Cu 50 sputter target. Pititjean et al [10][11][12] studied the effect of oxygen flow rate on the structure and properties of pulsed DC sputtered Ag-Cu-O films deposited using Ag 60 Cu 40 target. The effect of deposition temperature on the structural and optical properties of RF magnetron sputtered Ag 70 Cu 30 target was systematically studied [13].…”

Section: Introductionmentioning

confidence: 99%

Growth, electrical and optical behaviour of nanocrystalline Ag₂Cu₂O₃ films produced by RF magnetron sputtering

Reddy

Pierson

Uthanna

2011

Cryst. Res. Technol.

View full text Add to dashboard Cite

Thin films of Ag 2 Cu 2 O 3 were formed on glass substrates by RF magnetron sputtering technique under different oxygen partial pressures in the range 5×10-3 -8×10 -2 Pa using mosaic target of Ag 70 Cu 30 . The influence of oxygen partial pressure on the core level binding energies, crystallographic structure, and electrical and optical properties of the deposited films was studied. The atomic ratio of copper to silver in the films was 0.302. The oxygen content was in correlation with the oxygen partial pressure maintained during the growth of the films. The films formed at oxygen partial pressures <2×10 -2 Pa was mixed phase of Ag 2 Cu 2 O 3 and Ag. The films deposited at 2×10 -2 Pa were single phase of Ag 2 Cu 2 O 3 . The crystallite size of the films formed at 2×10 -2 Pa was 12 nm, while those films annealed at 473 K was 16 nm. The nanocrystalline Ag 2 Cu 2 O 3 films formed at oxygen partial pressure of 2×10 -2 Pa showed electrical resistivity of 8.2 Ωcm and optical band gap of 1.95 eV.

show abstract

Section: Introductionmentioning

confidence: 99%

Growth, electrical and optical behaviour of nanocrystalline Ag₂Cu₂O₃ films produced by RF magnetron sputtering

Reddy

Pierson

Uthanna

2011

Cryst. Res. Technol.

View full text Add to dashboard Cite

show abstract

“…The control of metal wettability through limited oxidation was originally applied by the same authors for fabricating highly efficient FTCEs using two‐dimensional continuous AgO x films as thin as 6 nm . However, in spite of the promising initial results, the proposed method has critical problems associated to the metal oxidation, which must be solved before the process can be practically applied . The deposition of oxidized metals by reactive sputtering requires a precise control of their oxidation due to the high oxidation affinity of the metals.…”

Section: Introductionmentioning

confidence: 99%

Bendable Solar Cells from Stable, Flexible, and Transparent Conducting Electrodes Fabricated Using a Nitrogen‐Doped Ultrathin Copper Film

Zhao

Kim

Lee

et al. 2016

Adv Funct Materials

103

View full text Add to dashboard Cite

Copper has attracted significant interests as an abundant and low‐cost alternative material for flexible transparent conducting electrodes (FTCEs). However, Cu‐based FTCEs still present unsolved technical issues, such as their inferior light transmittance and oxidation durability compared to conventional indium tin oxide (ITO) and silver metal electrodes. This study reports a novel technique for fabricating highly efficient FTCEs composed of a copper ultrathin film sandwiched between zinc oxides, with enhanced transparency and antioxidation performances. A completely continuous and smooth copper ultrathin film is fabricated by a simple room‐temperature reactive sputtering process involving controlled nitrogen doping (<1%) due to a dramatic improvement in the wettability of copper on zinc oxide surfaces. The electrode based on the nitrogen‐doped copper film exhibits an optimized average transmittance of 84% over a spectral range of 380 −1000 nm and a sheet resistance lower than 20 Ω sq−1, with no electrical degradation after exposure to strong oxidation conditions for 760 h. Remarkably, a flexible organic solar cell based on the present Cu‐based FTCE achieves a power conversion efficiency of 7.1%, clearly exceeding that (6.6%) of solar cells utilizing the conventional ITO film, and this excellent performance is maintained even in almost completely bent configurations.

show abstract

“…Furthermore, this process allows the preparation of films with different Ag/Cu atomic ratio 9. The effect of oxygen partial pressure 10–12, current applied to the sputter target 13 and annealing temperature 14 on the structural, electrical and optical properties of the silver–copper oxide films formed by reactive magnetron sputtering were studied. The excess of silver atoms in the deposited films compared to copper induced the synthesis of biphased coatings of metallic silver and silver–copper oxide films 13.…”

Section: Introductionmentioning

confidence: 99%

Effect of deposition temperature on the physical properties of RF magnetron sputtered Ag–Cu–O films with various Cu to Ag ratios

Uthanna

Reddy

Boulet

et al. 2010

Physica Status Solidi (a)

View full text Add to dashboard Cite

Thin films of Ag-Cu-O were deposited on glass substrates held at various temperatures in the 303-523 K range by RF magnetron sputtering of Ag 90 Cu 10 , Ag 80 Cu 20 and Ag 70 Cu 30 , and elemental copper and silver targets in an oxygen partial pressure of 2 Â 10 À2 Pa and sputtering pressure of 4 Pa. The deposited films were characterised by energy dispersive X-ray analysis, X-ray diffraction (XRD), atomic force microscopy, UV-Vis-NIR spectroscopy and employing four-point probe method. The atomic ratio of Cu/Ag in the films formed at 303 K was in correlation with the composition of the starting sputter targets. The increase in substrate temperature induced the decomposition of the Ag-Cu-O films into a mixture of metallic silver and copper oxide. The electrical resistivities of silver oxide and copper oxide films formed at 303 K were 3 Â 10 À3 V cm and 29 V cm, respectively. The electrical resistivity of the films formed with Ag 70 Cu 30 target at 303 K was 8.2 V cm and it decreased to 2.4 V cm with increase in substrate temperature to 523 K due to structural changes in the films. The optical band gap of the Ag-Cu-O films formed at 303 K increased from 1.60 to 1.95 eV with the increase of copper to silver atomic ratio from 0.10 to 0.30 in the films. The optical band gap of the films formed with Ag 70 Cu 30 target increased from 1.95 to 2.15 eV with the increase in substrate temperature from 303 to 523 K, respectively.

show abstract

Structure Control in Reactively Sputtered Ag/Cu/(Mn)/O Films

Cited by 8 publications

References 60 publications

Growth, electrical and optical behaviour of nanocrystalline Ag₂Cu₂O₃ films produced by RF magnetron sputtering

Growth, electrical and optical behaviour of nanocrystalline Ag₂Cu₂O₃ films produced by RF magnetron sputtering

Bendable Solar Cells from Stable, Flexible, and Transparent Conducting Electrodes Fabricated Using a Nitrogen‐Doped Ultrathin Copper Film

Effect of deposition temperature on the physical properties of RF magnetron sputtered Ag–Cu–O films with various Cu to Ag ratios

Contact Info

Product

Resources

About

Structure Control in Reactively Sputtered Ag/Cu/(Mn)/O Films

Cited by 8 publications

References 60 publications

Growth, electrical and optical behaviour of nanocrystalline Ag2Cu2O3 films produced by RF magnetron sputtering

Growth, electrical and optical behaviour of nanocrystalline Ag2Cu2O3 films produced by RF magnetron sputtering

Bendable Solar Cells from Stable, Flexible, and Transparent Conducting Electrodes Fabricated Using a Nitrogen‐Doped Ultrathin Copper Film

Effect of deposition temperature on the physical properties of RF magnetron sputtered Ag–Cu–O films with various Cu to Ag ratios

Contact Info

Product

Resources

About

Growth, electrical and optical behaviour of nanocrystalline Ag₂Cu₂O₃ films produced by RF magnetron sputtering

Growth, electrical and optical behaviour of nanocrystalline Ag₂Cu₂O₃ films produced by RF magnetron sputtering