Structure, mechanical and corrosion properties of DC reactive magnetron sputtered aluminum nitride (AlN) hard coatings on mild steel substrates

Subramanian, B.; Ashok, K.; Jayachandran, M.

doi:10.1007/s10800-008-9480-z

Cited by 10 publications

(5 citation statements)

References 29 publications

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“…Nevertheless, making bulk AlN often requires sintering at very high temperatures under controlled atmosphere, which is not economically feasible. AlN thin films offering an alternative to the bulk AlN are often produced by reactive magnetron sputtering . Conventionally making such nitride films, similar to other nitride thin films, requires a low base pressure (high vacuum) before sputtering to minimize the influences of residual gases that may cause the formation of oxide or oxynitride overlayers.…”

Section: Introductionmentioning

confidence: 99%

Low Vacuum Deposition of Aluminum Nitride Thin Films by Sputtering

Yao

2012

Int J Applied Ceramic Tech

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Conventionally, sputtering deposition of thin films requires a low base pressure (high vacuum) to minimize influences of residual gases. Here, a high base pressure (low vacuum) was used, which can reduce significantly the overall processing time. Aluminum nitride ( AlN ) was selected as a model system of dielectric nitrides. All the analyses revealed that the obtained films under a low vacuum environment within specific processing windows exhibited characteristics similar to those of high‐vacuum made AlN films. Such a low vacuum deposition technique takes advantages of kinetically favorable formation of the nitride films and hence, has great potentials in many more technological applications.

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Section: Introductionmentioning

confidence: 99%

Low Vacuum Deposition of Aluminum Nitride Thin Films by Sputtering

Yao

2012

Int J Applied Ceramic Tech

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“…In the TEM image, the precipitates are marked with white arrows. The SAED pattern revealed that the lattice parameter was 0.246 nm, corresponding to the AlN hexagonal wurtzite crystal structure [35]. Figure 8b shows the elemental distribution maps for Fe, Al, and N using the EELS analysis at the red box in Figure 8a.…”

Section: Resultsmentioning

confidence: 99%

Effect of Laser Heat-Treatment and Laser Nitriding on the Microstructural Evolutions and Wear Behaviors of AISI P21 Mold Steel

Shin

Yoo

Kim

et al. 2020

Metals

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Laser heat-treatment and laser nitriding were conducted on an AISI P21 mold steel using a high-power diode laser with laser energy densities of 90 and 1125 J/mm2, respectively. No change in surface hardness was observed after laser heat-treatment. In contrast, a relatively larger surface hardness was measured after laser nitriding (i.e., 536 HV) compared with that of the base metal (i.e., 409 HV). The TEM and electron energy loss spectroscopy (EELS) analyses revealed that laser nitriding induced to develop AlN precipitates up to a depth of 15 μm from the surface, resulting in surface hardening. The laser-nitrided P21 exhibited a superior wear resistance compared with that of the base metal and laser heat-treated P21 in the pin-on-disk tribotests. After 100 m of a sliding distance of the pin-on-disk test, the total wear loss of the base metal was measured to be 0.74 mm3, and it decreased to 0.60 mm3 for the laser-nitrided P21. The base metal and laser heat-treated P21 showed similar wear behaviors. The larger wear resistance of the laser-nitrided P21 was attributed to the AlN precipitate-induced surface hardening.

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“…Lӧbl et al [24] and Treichel and Kirchhoff [25] have demonstrated that the substrate temperature and the energy of the particles impinging on the substrate were the two key factors, for the crystallization of the sputtered film. During DC reactive magnetron sputtering the particles generally impinge on the substrate with 1-10 eV energy [26], which facilitates the crystallization of sputtered TiN/NbN multilayered coating. Increase in substrate temperature to 400 °C causes the TiN/NbN multilayered coatings to exhibit a strong orientation along (111)/(101) and other peaks (200)/(103), (220)/(106), and (222)/(108) as well.…”

Section: Resultsmentioning

confidence: 99%

Effect of substrate temperature on the properties of reactively sputtered TiN/NbN multilayers

Subramanian

Jayachandran

2011

Cryst. Res. Technol.

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TiN/NbN multilayer coatings were deposited with various substrate temperatures by DC reactive magnetron sputtering method onto Si (111) and glass substrates. The effect of substrate temperature on the structural and optical properties of TiN/NbN multilayers was investigated by X-ray diffraction, X-ray photoelectron spectroscopy, Field emission scanning electron microscopy and Photoluminescence measurements. The composition was analyzed by X-ray photoelectron spectroscopy. X-ray diffraction results showed that the layers crystallized in cubic structure for TiN and hexagonal structure for NbN. It was found that grain size increased with increase in substrate temperature. The surface morphology of the TiN/NbN thin films showed a dense and smooth surface with substrate temperature upto 200 °C but after 300 °C, the grains became larger and coarse surface was observed. The TiN/NbN multilayer coatings exhibited the characteristic peaks centered at 180, 210 and 560 cm -1. Red band emission peaks were observed in the wavelength range of 700-710 nm.

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Structure, mechanical and corrosion properties of DC reactive magnetron sputtered aluminum nitride (AlN) hard coatings on mild steel substrates

Cited by 10 publications

References 29 publications

Low Vacuum Deposition of Aluminum Nitride Thin Films by Sputtering

Low Vacuum Deposition of Aluminum Nitride Thin Films by Sputtering

Effect of Laser Heat-Treatment and Laser Nitriding on the Microstructural Evolutions and Wear Behaviors of AISI P21 Mold Steel

Effect of substrate temperature on the properties of reactively sputtered TiN/NbN multilayers

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