We present the results of first principle calculations on the behaviour of molecular hydrogen within crystalline silicon, both as an isolated species, and within defects in the material. These results are compared with recent experimental infra-red and Raman data obtained for silicon treated by either hydrogen plasma or soaked in hydrogen gas. The effect of Fermi-level position on the diffusion barrier of molecular hydrogen within silicon is also discussed.Interest in the behaviour of molecular hydrogen within silicon has been fuelled by the recent observation of H 2 sited at three distinct environments within crystalline silicon by infrared [1,2]