1999
DOI: 10.4028/www.scientific.net/ssp.71.173
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The Interaction of Hydrogen with Deep Level Defects in Silicon

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Cited by 60 publications
(39 citation statements)
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References 221 publications
(374 reference statements)
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“…It is commonly assumed that the improvement of passivation quality during a firing step is, at least in part, re-lated to a hydrogen passivation of interface states [32], [33]. Accordingly, a loss of hydrogen at higher annealing temperatures as suggested in [34]- [36] or a reconfiguration of hydrogen bonding states [37], [38] could lead to a decrease in surface passivation quality. Such a hydrogen-based degradation mechanism could also explain why a nonfired sample and an annealed sample show significantly less degradation of surface passivation quality compared to a fired sample as described in [14].…”
Section: Discussionmentioning
confidence: 99%
“…It is commonly assumed that the improvement of passivation quality during a firing step is, at least in part, re-lated to a hydrogen passivation of interface states [32], [33]. Accordingly, a loss of hydrogen at higher annealing temperatures as suggested in [34]- [36] or a reconfiguration of hydrogen bonding states [37], [38] could lead to a decrease in surface passivation quality. Such a hydrogen-based degradation mechanism could also explain why a nonfired sample and an annealed sample show significantly less degradation of surface passivation quality compared to a fired sample as described in [14].…”
Section: Discussionmentioning
confidence: 99%
“…They suggest that this procedure results in a non equilibrium distribution of hydrogen in the silicon sample. Hydrogen molecules at tetrahedral interstitial sites were suggested as main hydrogen configuration after coot down [20,21). For high enough temperatures ( > 170 oc for 30 min tempering steps), hydrogen starts to redistribute with the pre ferred bound state depending on temperature.…”
Section: Influence Of Mid-temperature Steps On Regenerationmentioning
confidence: 99%
“…McQuaid et al showed that tempe ring steps at -200 ·c for 30 min or at -175 ·c for 100 min lead to maximal concentration of boron hydrogen pairs whereas higher temperatures result in decreasing concen trations until virtually no boron hydrogen pairs could be found anymore after 30 min tempering steps above 380 •c jones et al hypothesized that in the latter case hydrogen rather forms more stable hydrogen configurations, e.g. vacancy hydrogen complexes instead of binding to boron [21]. Fig.…”
Section: Influence Of Mid-temperature Steps On Regenerationmentioning
confidence: 99%
“…It reacts especially with strained bonds in vacancies. Consequently, hydrogen has a great effect on centers with deep levels, as these often involve unsaturated Si atoms or possess weak bonds [8]. To evaluate the grown-in defect interaction with impurities on the interface, the EPR signal and the charge value in SiO 2 dependence on the oxide thickness for n-and p-type CZ and FZ samples were investigated (Fig.…”
Section: Resultsmentioning
confidence: 99%