The high refractive index, broadband transparency, and low spectral absorption of HfO 2 (hafnia) make it a suitable choice for thermally stable nanoscale optical filters, UV mirrors, and antireflection coatings. However, achieving dense thin films of HfO 2 with bulk-like optical properties has been a challenge due to differences in film stoichiometric and spatial uniformity at nanoscale thicknesses. Here, we assess HfO 2 thin films (i.e., <200 nm thicknesses) prepared using pulsed laser deposition (PLD) at different substrate temperatures (20−675 °C) and the associated chemical, structural, and optical properties are reported. X-ray diffraction analysis reveals that nanoscale-thick thin films of HfO 2 deposited at an ambient substrate temperature (20 °C) using PLD are amorphous with embedded nanocrystallites, whereas films deposited on heated substrates are polycrystalline monoclinic HfO 2 . For the films deposited on heated substrates, further analysis shows that the nanocrystalline phase does not change with increasing substrate temperatures; however, the texture of the crystalline orientation changes to favor (111) at 300−675 °C from the initial (002) orientation at ambient substrate temperature. Such differences in nanoscale-thick thin-film HfO 2 PLD process-dependent amorphousness, crystallinity, and surface textures discussed here exhibit minimal influence on the resulting broadband optical properties (250 nm−30 μm). Furthermore, we show that the complex refractive index of high-density nanoscale-thick thin-film HfO 2 prepared at an ambient substrate temperature using PLD resembles that of bulk HfO 2 responses. The achievement of fully stoichiometric, high-density, thin-film HfO 2 from PLD is expected to further enable thermally robust nanoscale photonic device integration involving low-dimensional high-performance optical and optoelectronic applications.