Studies of the Cr-CrN coating characteristics formed by means of the magnetron sputtering method from bulk target

Kachalin, G. V.; Mednikov, A. F.; Tkhabisimov, A. B.; Sidorov, S. V.

doi:10.1088/1742-6596/872/1/012040

Cited by 4 publications

(1 citation statement)

References 2 publications

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“…With the development of economy, science and technology, people have put forward higher requirements on the ability of various products to withstand the bad environment. In order to make the existing products run stably under the bad environment for a long time, the surface modified film of high hardness and wear resistance has become the first choice [1][2][3][4]. TiN films are widely used in today's industrial fields because of their advantages, such as high hardness, excellent wear resistance and corrosion resistance.…”

Section: Introductionmentioning

confidence: 99%

Mechanical properties of TiN films prepared in glow-arc transition region

Liu

Jiang

2020

Surface Engineering

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Titanium nitride (TiN) films were generated in the abnormal glow discharge (AGD) region and the glow-arc transition discharge (GATD) region by varying target current density (J a ) in an Ar/N 2 atmosphere in the pulsed DC magnetron sputtering system. The effects of different discharge regions on the structure and mechanical properties of TiN films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), scratch test and micro-hardness test. The results indicated that all TiN films exhibited a strong (220) preferred orientation. J a of 0.24 A cm −2 was a demarcation point between the AGD and GATD region. Compared with the AGD films, the GATD TiN films exhibited smooth surface, regular dense columnar structures and small grain sizes. Especially, TiN films deposited at 0.4 A cm −2 showed the highest hardness (2388 HV) and the best adhesion (up to 55 N).

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Section: Introductionmentioning

confidence: 99%