“…Various physical and chemical techniques can be employed for preparing pure and metaldoped NiO thin films for tuning changes in the surface morphology, optical, and structural properties of the as-prepared NiO films including sol-gel dip-coating [7,8], successive ionic layer adsorption and reaction (SILAR) [9], chemical bath deposition (CBD) [10,11], pulsed laser deposition (PLD) [12][13][14], spray pyrolysis [15,16], electrodeposition [17][18][19], and DC sputtering [20][21][22][23][24]. Deposited NiO thin films can be extensively used for various applications, including supercapacitor [25,26], gas sensors [24,27,28], electrochromic application [29,30], buffer layer in the organic solar cell [31,32], and photocatalysis [33][34][35][36].…”