2011
DOI: 10.1016/j.jcrysgro.2010.11.166
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Studies on the InGaGdN/GaN magnetic semiconductor heterostructures grown by plasma-assisted molecular-beam epitaxy

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Cited by 11 publications
(8 citation statements)
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“…In particular, plasmas are commonly used in the growth of ultra-thin epitaxial semiconducting layers for the generation of atomic nitrogen through the effective dissociation of nitrogen molecules. One example is the plasma-assisted molecularbeam epitaxy of complex InGaGdN/GaN magnetic semiconductor superlattice structures [270].…”
Section: Other 2d Nanomaterialsmentioning
confidence: 99%
“…In particular, plasmas are commonly used in the growth of ultra-thin epitaxial semiconducting layers for the generation of atomic nitrogen through the effective dissociation of nitrogen molecules. One example is the plasma-assisted molecularbeam epitaxy of complex InGaGdN/GaN magnetic semiconductor superlattice structures [270].…”
Section: Other 2d Nanomaterialsmentioning
confidence: 99%
“…Tawil et al grew InGaN:Gd layers using PA-MBE on GaN (0001) templates. 33,34 Growth at 400°C produced an In content up to 28% and 35% and C Gd levels ∼1 at. %.…”
Section: Magnetic Properties Of Iii-n:rementioning
confidence: 99%
“…RE elements, such as Gd, may introduce additional capabilities to the ZnO system because they may be capable of constructing combined practical devices on a single chip by combining magnetic and optical properties (Ohno et al 1996;Tawil et al 2011).…”
Section: Introductionmentioning
confidence: 99%