Studies on Zinc Oxide Nanorods Grown by Electron Beam Evaporation Technique

Giri, P. K.; Patel, Purvi; Panchal, C. J.; Bhattacharyya, S. R.; Kumari, Saroj; Singh, Dilip K.; Kheraj, Vipul; Shah, Nilam; Vakil, P. D.; Patel, K. J.; Desai, M.N.; Rehani, Bharati; Rao, Vandana J.; Desai, Rajendra G.; Lakshminarayana, D.; Patel, Pinak

doi:10.1080/15533170701466018

Cited by 14 publications

(4 citation statements)

References 13 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Many techniques have been used for depositing high quality ZnO thin films. Some of them are electrodeposition technique [5,6], electrospinning technique [7], pulsed laser deposition [8], RF sputtering [9], chemical solution deposition [10,11], electron beam evaporation [12,13], the sol -gel method [14], spray pyrolysis [15,16], ultrasonic spray pyrolysis technique [3].…”

Section: Introductionmentioning

confidence: 99%

Effect of Dip Time on Electrodeposited Zinc Oxide Nanofilm

Okoli¹

2018

AJMSP

View full text Add to dashboard Cite

Nanofilms of Zinc Oxide (ZnO) were fabricated from solutions of zinc tetraoxosulphate heptahydrate, citric acid, and sodium hydroxide onto a Fluorine Tin Oxide (FTO) conductive glass by elecrodeposition process. Time as bath parameter was varied. Three samples with time interval of 30 seconds, 60 seconds and 90 seconds were fabricated. Absorbance of the films was determined with the help of spectrophotometer. Other optical properties of the nanofilms were calculated using the appropriate equations from the literature. The deposited nanofilms have high absorbance in UV region and low absorbance in VIS -NIR region. Transmittance of the nanofilms is low in UV region and high in VIS -NIR region. Reflectance of the films is low throughout the UV -VIS -NIR regions. The optimal optical thickness of 270 nm was obtained at 90 seconds. The bandgap of the nanofilms obtained is between 3.30 to 3.60 eV. Average crystallite size of 43.04 nm was obtained for the deposited ZnO thin film.

show abstract

Section: Introductionmentioning

confidence: 99%

Effect of Dip Time on Electrodeposited Zinc Oxide Nanofilm

Okoli¹

2018

AJMSP

View full text Add to dashboard Cite

show abstract

“…[81][82][83][84][85][86][87][88][89][90][91][92][93][94] Thus, an effort has been made in the present review to explore the optimal synthetic conditions of physical vapor deposition methods for fabrication of ZnO thin films and their utilization for various practical and industrial applications.…”

Section: Materials Expressmentioning

confidence: 99%

ZnO nanostructured thin films: Depositions, properties and applications—A review

Kumar¹,

Kumar²,

Aldossary³

et al. 2015

Mat Express

View full text Add to dashboard Cite

The present review focuses on the growth, properties and applications of ZnO thin films grown by various physical deposition techniques. An overview on several deposition methods such as thermal evaporation, arc deposition, pulse laser deposition and sputtering for the growth of ZnO thin films are discussed in this review. Several factors such as substrate temperature, gas pressures, oxygen partial pressures, and post growth annealing temperatures which influence the properties of ZnO thin films are also discussed. Various ZnO thin film properties such as surface morphologies, surface film thickness, grain size, optical transmittance, sensitivity, electrical conductivity, uniformity and electrical resistivity are presented in this review. In addition, numerous applications of ZnO thin films, for instance, thin film based gas sensors, surface acoustic wave (SAW) devices; thin film transistors (TFTs), light emitting diodes (LEDs) and solar cells are discussed.

show abstract

“…The past decade has witnessed the emergence of electron beam technologies for the design and fabrication of nanostructures. For instance, nanostructured zinc oxide (e.g., ZnO) thin films can be grown by using a 6 kW electron beam evaporation technique . Focused electron beam-induced deposition (FEBID) is a promising method consisting of the concomitant deposition of the precursor molecules with the exposition to a kiloelectronvolt electron beam. , During the electron irradiation process, the primary and secondary electrons act as the molecular decomposition agents, , and the mechanisms of the different involved processes have been reviewed according to the energy range of these irradiating particles .…”

Section: Introductionmentioning

confidence: 99%

Decomposition of Bis(acetylacetonate)zinc(II) by Slow Electrons

2020

View full text Add to dashboard Cite

The production of zinc-containing nanostructures has a large variety of applications. Using electron beam techniques to degrade organometallic molecules for that purpose is perhaps one of the most versatile methods. In this work, we investigate the scattering of low-energy (<12 eV) electrons with bis(acetylacetonate)zinc(II) molecules. We show that core excited and high-lying shape resonances are mainly responsible for the production of the precursor anions as well as the ligand negative fragments, which are observed exclusively at electron energies of >3 eV. The mechanisms for electron capture and then molecular dissociation are discussed in terms of density functional theory studies.

show abstract

Studies on Zinc Oxide Nanorods Grown by Electron Beam Evaporation Technique

Cited by 14 publications

References 13 publications

Effect of Dip Time on Electrodeposited Zinc Oxide Nanofilm

Effect of Dip Time on Electrodeposited Zinc Oxide Nanofilm

ZnO nanostructured thin films: Depositions, properties and applications—A review

Decomposition of Bis(acetylacetonate)zinc(II) by Slow Electrons

Contact Info

Product

Resources

About