Study for Improvement of Laser Induced Damage of 1064 nm AR Coatings in Nanosecond Pulse

Abstract

For the conventionally polished fused silica substrate, an around 100 nm depth redeposition polishing layer was formed on the top of surface. Polishing compounds, densely embedded in the redeposition polishing layer were the dominant factor that limited the laser induced damage threshold (LIDT) of transmission elements in nanosecond laser systems. Chemical etching, super-precise polishing and ion beam etching were employed in different ways to eliminate these absorbers from the substrate. After that, Antireflection (AR) coatings were deposited on these substrates in the same batch and then tested by 1064 nm nano-pulse laser. It was found that among these techniques only the ion beam etching method, which can effectively remove the polishing compound and did not induce extra absorbers during the disposal process, can successfully improve the LIDT of AR coatings.

Revisiting Defect-Induced Light Field Enhancement in Optical Thin Films

“…The laser-induced damage threshold of optical thin film affects the output energy and service life of the whole laser system. A lot of studies have shown that nano-defects caused by the fabrication of optical thin films are deemed as a potential source affecting the laser damage susceptibility [1][2][3][4][5][6]. It is believed that the laser-induced damage is the coupling damage process of multi-physical fields.…”

Monitoring laser conditioning effect by real-time thermo-reflectance measurement

“…The laser-induced damage of optical films is a fundamental challenge in the development of high power or highpeak-intensity laser systems such as the American NIF devices, French LMJ instruments and ICF systems [1][2][3][4]. Optical thin film with high laser-induced damage thresholds is a pivotal component in high-power laser system.…”