2003
DOI: 10.1088/0268-1242/18/4/311
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Study of damage and stress induced by backgrinding in Si wafers

Abstract: In this paper, a profound study of the subsurface damage induced by backgrinding Si wafers is presented. It is shown that a thin amorphous layer (30-80 nm) is generated during backgrinding. Below the amorphous layer, there is a polycrystalline zone. Its thickness (about 0.5 µm) is obtained from Raman spectroscopy measurements. Below that layer, there is a strained crystalline zone. Its stress can be roughly calculated from warpage measurements of the wafer. The stress is also measured directly by Raman spectro… Show more

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Cited by 102 publications
(48 citation statements)
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“…This level of strain generates a 5 MPa stress for the elastic modulus measured. The corresponding deflection can be roughly estimated using Stoney's equation [27,28] r Et 2…”
mentioning
confidence: 99%
“…This level of strain generates a 5 MPa stress for the elastic modulus measured. The corresponding deflection can be roughly estimated using Stoney's equation [27,28] r Et 2…”
mentioning
confidence: 99%
“…However, as shown in Figure 5b, the differences in the estimation differences may be attributed to a 3PB bending moment that is not aligned with the crucial assumption of Stoney's formula, where film stresses and the associated system curvatures are non-uniformly distributed over the test specimen area [38]. Moreover, the variations of the silicon thickness on the displacement loading and micro-defect on the actual silicon surfaces may also contribute to the potential differences [26]. Hence, the appropriate SBS estimation of a silicon should be accomplished with a lab scale test but Stoney's formula can be utilised for a thin film stress for a possible wafer warpage stress.…”
Section: Influence Of Silicon Thicknesses On Sbsmentioning
confidence: 97%
“…Although the damaged layer is not a real thin film, it is assumed as a thin layer and its stress can be calculated, where E / (1 -ν) is the biaxial modulus of the substrate, h is the substrate thickness, t is the film thickness, and R is the radius of the curvature. This analytical estimation will be compared to the experimental data to check on the sensitivity of the available lab scale test data, which is also being explored by [26], before analysing the bending stress from the curvature of a silicon wafer. by [27].…”
Section: Introductionmentioning
confidence: 99%
“…Die strength of the thinned wafer can be evaluated by using the different mechanical testing techniques such as three point bend test, four point bend test, ball on ring test, ball breaker tests and ring-on-ring tests. The mechanical tests are greatly influenced by several processes and material parameters such as surface roughness or finish, degree of thinning, stress relief process, quality of the dicing edge [11][12][13][14][15]. However the literature available related to the effect of grinding processes on the active side of the die/chip is limited, and this necessitates a focused study on the effect of wafer back grinding on the active side of chip.…”
Section: Low-k Dielectric Materials For Beol (Back End Of the Line) Mmentioning
confidence: 99%