2017
DOI: 10.12693/aphyspola.131.833
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Study of Magnetic Micro-Ellipses by Cantilever Sensor

Abstract: In this paper, we propose a method for prototyping cantilever sensors by means of a modification of commercial atomic force microscopy cantilevers, using electron beam lithography and focused ion beam milling. To overcome obstacles with resist coating related to spin-coating of nonplanar 3D substrates, in this case of free-standing cantilevers, we propose a modified method based on spin-coating technique. An auxiliary atomic force microscopy chip was inserted below the cantilever to quasi-planarize the surface… Show more

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(1 citation statement)
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“…In principle, well-established photolithography is a relatively efficient method to realize material micropatterning. Nevertheless, conventional direct spin-coating of liquid photoresists onto freestanding, flexible, and 3D-structured cantilevers is rather challenging mainly due to so-called edgebead effects [10,11]. These edge-bead effects result in an inhomogeneous resist layer thickness, which typically yields dissatisfying results for resist exposure and development.…”
Section: Introductionmentioning
confidence: 99%
“…In principle, well-established photolithography is a relatively efficient method to realize material micropatterning. Nevertheless, conventional direct spin-coating of liquid photoresists onto freestanding, flexible, and 3D-structured cantilevers is rather challenging mainly due to so-called edgebead effects [10,11]. These edge-bead effects result in an inhomogeneous resist layer thickness, which typically yields dissatisfying results for resist exposure and development.…”
Section: Introductionmentioning
confidence: 99%