Study of precursor chemistry and solvent systems in pp-MOCVD processing with alumina case study

Gunby, Nathaniel R.; Krumdieck, Susan; Murthy, Hari; Masters, Sarah L.; Miya, S.

doi:10.1002/pssa.201532309

Cited by 5 publications

(3 citation statements)

References 21 publications

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“…Hexane has six times higher vapor pressure than toluene, so one might conclude that hexane would be a vastly superior choice. However in our recently reported preliminary study of pp‐MOCVD alumina deposition using different precursors and solvents, we did not get markedly different results due to solvent alone . The erroneous shorter drop life for toluene seemed to possibly fit with one aspect of our previous results, but this could definitely be due to one of many other factors like solvent and precursor chemistry and variability of working conditions.…”

supporting

confidence: 39%

Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid‐pulsed CVD

Boichot¹,

Krumdieck²

2015

Chemical Vapor Deposition

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The original article presented the modeling for nonsteady evaporation processes of liquid solution droplets injected into a pumped-down low-pressure vessel having a specified wall temperature. Numerical simulations were carried out for one of the few precursors with sufficient physical property data, TTIP. The authors compared the droplet evaporation processes for two possible solvents, toluene and hexane. Unfortunately, a discrepancy in the unit systems of the property references (molar units vs mass units) was not detected during the modeling used in this paper. We present here the correct property values, the corrected figures and updated discussion. The sensitivity analysis and stages of the vaporization process elicited in the simulations are not affected by this error. Updated Figures 5, 6, 7, 10 and 11 showing corrected droplet evaporation times for a process, normalized to 10 s cycles, are given here.The ). In consequence, the vaporization times for TTIP and toluene mixtures were underestimated. The vaporization time of a mixture of TTIP and hexane is 3.81 s (instead of 2.35 s). The

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supporting

confidence: 39%

Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid‐pulsed CVD

Boichot¹,

Krumdieck²

2015

Chemical Vapor Deposition

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“…Hexane is a much more volatile solvent than toluene, with P sat = 21819 Pa for hexane compared to P sat = 4171 Pa for toluene at 300K, but the high evaporation enthalpy of hexane leads to a strong cooling of droplets. The vaporization efficiency seems to be much lower for hexane than for toluene . Previous studies with toluene and TTIP have also demonstrated that very high vaporization efficiency is possible …”

Section: Optimal Process Parameters and Controlmentioning

confidence: 84%

Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid‐pulsed CVD

Boichot

Krumdieck

2015

Chemical Vapor Deposition

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International audienceThis article presents an approach for modeling the vaporization of droplets of solvent and precursor mixture under vacuum in the pulsed-pressure (pp) CVD process. The pulsed, direct liquid injection apparatus with ultrasonic atomizer is demonstrated as a controllable and reliable alternative to the bubbler and carrier gas system. The numerical modeling solves mass, heat, and momentum continuity equations on liquid droplets, and is intended to evaluate the relative roles of the physical chemistry properties and reactor parameters in the fast vaporization of droplets. The sensitivity analysis proposed here shows that the vaporization time into the pulsed-liquid CVD system is mainly dependent on the heating available in the flash evaporation zone, then on the thermodynamic properties of the liquid solution

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“…The alumina precursor (2 g) was dissolved in cyclohexane (80 ml) to form a final concentration of 0.02 M. Cyclohexane was selected as a solvent since there are studies where it has been observed that it favors the growth of spherical structures with few agglomerations (Gunby, Krumdieck, Murthy, Masters, & Miya, 2015).…”

Section: Precursor and Solventmentioning

confidence: 99%

Alumina layer using low-cost direct liquid injection metal organic chemical vapor deposition (DLI-MOCVD) on AISI 1018 steel

Pérez

López

Pérez

2020

JART

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Amorphous alumina layers were deposited on low carbon steel (AISI 1018) substrates by the direct liquid injection metal organic chemical vapor deposition (DLI-MOCVD) technique. For the DLI- MOCVD technique, two temperatures were used: a vaporization chamber temperature of 180 °C and a reaction chamber temperature of 370 °C. Liquid precursor aluminum tri-sec-butoxide was introduced in form of atomized liquid, each pulse of 1 Hz frequency and 3 ms opening time, the solution was pressurized at 40 psi under inert Argon atmosphere. 200 sccm of Argon were used as continuous carrier gas during all the deposition process. Microscopy and XRD techniques were used to characterize the deposited material. The thickness of the alumina coatings was of 100 μm, approximately.

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Study of precursor chemistry and solvent systems in pp-MOCVD processing with alumina case study

Cited by 5 publications

References 21 publications

Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid‐pulsed CVD

Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid‐pulsed CVD

Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid‐pulsed CVD

Alumina layer using low-cost direct liquid injection metal organic chemical vapor deposition (DLI-MOCVD) on AISI 1018 steel

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