Study on cationic photopolymerization reaction of epoxy polysiloxane

Sun, Fang; Jiang, Sijiu; Liu, J.

doi:10.1016/j.nimb.2007.09.027

Cited by 21 publications

(13 citation statements)

References 8 publications

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“…And the concentration of photoinitiator is one of the key factors that affected the generation of the initiating species. 23 In this work, the effect of photoinitiator (Darocur 1173) concentration on photopolymerization behavior of APSUA was investigated.…”

Section: Photopolymerization Kineticsmentioning

confidence: 99%

Synthesis and characterization of alkali‐soluble photosensitive polysiloxane urethane acrylate

Sun

Liao

Zhang

et al. 2011

J of Applied Polymer Sci

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A novel alkali-soluble photosensitive polysiloxane urethane acrylate (APSUA) was synthesized via reacting bifunctional isocyanate with three kinds of hydroxyl group respectively, from hydroxyl silicone oil, dimethylol propionic acid (DMPA), and a compound which also has acrylate groups. The compound was prepared via reacting acrylic acid with N,N,N 0 ,N 0 -tetraglycidyl -4,4 0 -diamino diphenyl methane (AG-80). The optimum temperature for the synthesis reaction of APSUA was found to be 50 C. The structure of the oligomer was characterized by IR, 1 HNMR, and GPC. The numberaverage molecular weight of the APSUA was 7795. The APSUA possesses excellent compatibility with most of acrylate monomers. The effect of concentration of photoinitiator and monomers on the photopolymerization kinetics of the oligomer APSUA was investigated by realtime infrared spectroscopy (RT-IR). The results show that APSUA can well photopolymerize under UV-irradiation. The optimal concentration of photoinitiator (Darocur 1173) was determined as 0.1 wt %. The system of APSUA with DPGDA monomer has higher polymerization rate (0.0521 s À1) and higher double bond conversion (93.2%), respectively. The APSUA system with acrylate monomers can form regular image under UV-irradiation through a patterned mask. The cured coating film of the APSUA system possesses excellent flexibility, toughness and heat resistance. The APSUA system can dissolve in 1% sodium carbonate solution easily and completely.

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Section: Photopolymerization Kineticsmentioning

confidence: 99%

Synthesis and characterization of alkali‐soluble photosensitive polysiloxane urethane acrylate

Sun

Liao

Zhang

et al. 2011

J of Applied Polymer Sci

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“…[16][17][18][19][20] The introduction of silicon can be broadly divided into chemical and physical compound. The silicon segments of the polyurethane are introduced by reaction of end group containing active hydrogen of higher molecular weight of methyl silicone and polyurethane prepolymer remaining isocyanate, so this organosilicon modification can effectively contain silicon segments that endow the polymer performance, but it would have been produced different degree of phase separation in the molecular chain segment size.…”

Section: Introductionmentioning

confidence: 99%

Study on waterborne polyurethanes based on poly(dimethyl siloxane) and perfluorinated polyether

Yang

Zhou

2015

Macromol. Res.

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Methylsiloxane and fluorinated segments were introduced into the polymer backbone of polyurethane by direct reaction of isocyanate with dialcohol terminated perfluoropolyether (E10-H) and poly(dimethyl siloxane) (PDMS). The polyurethane structure was revealed by Fourier transform infrared spectrometer in ATR mode and Xray photoelectron spectroscope. It was found that the silicon and fluorine moieties easily migrated to the surface of material in film-forming process due to their lower energy, so the water contact angle on membrane surface was greatly enhanced (maximum 100.1º), and the hydrophobic property of material was improved. Different degree of phase separation was observed by scanning electron microscope. Increment of PDMS or E10-H content caused the phase separation obviously, but section of PDMS and E10-H modified polyurethane showed that phase separation reduced. The linear dynamic viscoelastic measurements indicated that the dynamic storage modulus of all samples increased with the increment of frequency, and PDMS modified WPU's grew fastest. The slope of G' vs. G'' showed a decrement, so each sample had a shear thinning behavior. The perfluoropolyether oil was to reduce viscosity of the system.

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“…Polysiloxanes have many unique properties 20 such as good resistance to high temperature, excellent weatherability, low surface tension and energy, low dielectric constant and high resistance to an array of chemical substances due to its unusual molecular structure. Specifically, the prominent low surface tension of polysiloxane provides the potential for self-floating ability that results in the spontaneous formation of a concentration gradient distribution and an enrichment at the surface, which is very valuable for the control of gradient property, and surface microstructure and property of gradient materials 21,22 .…”

Section: Introductionmentioning

confidence: 99%

Tuning the surface microstructure and gradient properties of polymers with photopolymerizable polysiloxane-modified nanogels

et al. 2014

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This paper reports a series of photopolymerizable polysiloxane-modified nanogels for regulating surface microstructure and gradient property of polymers, which were synthesized by solution polymerization under different feed ratios of a methacrylate-modified polysiloxane, urethane dimethacrylate (UDMA) and isobornyl methacrylate (IBMA) in the presence of a thiol chain transfer agent. The nanogel structure and composition were characterized by proton nuclear magnetic resonance (1H-NMR), Fourier transform-infrared spectroscopy (FT-IR), transmission electron microscope (TEM), gel permeation chromatography (GPC) and differential scanning calorimetry (DSC). The dispersion of these nanogels in triethylene glycol dimethacrylate (TEGDMA) can reduce the onset and magnitude of shrinkage stress during polymerization without compromise to mechanical properties of the resulting polymers. Most importantly, as demonstrated by elemental analysis and X-ray photoelectron spectroscopy (XPS), the nanogels exhibit good self-floating ability in the monomer/polymer matrix and the increase of polysiloxane content in the nanogel can enhance the self-floating capability due to the lower surface tension and energy associated with the polysiloxane component. As a result, the polysiloxane-modified nanogels can spontaneously form a concentration gradient that can be locked in upon photopolymerization leading to a well-controlled heterogeneous polymer that presents a gradient change in thermal stability. With the increase of polysiloxane content, the thermal stability of the polymer was improved significantly. Furthermore, the enrichment of the nanogel on the surface resulting from the good self-floating ability can reduce the dispersion surface energy of gradient polymer film and generate a more hydrophobic surface with altered surface microstructure. These photopolymerizable polysiloxane-modified nanogels are demonstrated to have potential broad application in the preparation of gradient polymer with controlled surface properties.

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Study on cationic photopolymerization reaction of epoxy polysiloxane

Cited by 21 publications

References 8 publications

Synthesis and characterization of alkali‐soluble photosensitive polysiloxane urethane acrylate

Synthesis and characterization of alkali‐soluble photosensitive polysiloxane urethane acrylate

Study on waterborne polyurethanes based on poly(dimethyl siloxane) and perfluorinated polyether

Tuning the surface microstructure and gradient properties of polymers with photopolymerizable polysiloxane-modified nanogels

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