2023
DOI: 10.1021/acs.langmuir.2c02467
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Study on Room-Temperature Wet Oxidation of Silicon Catalyzed by Copper

Abstract: The anomalously fast growth of the silicon oxide layer at room temperature has been reported for the Cu/Si system. However, the systematical exploration of such a reaction under humidity conditions has not yet been carried out. Through one combination of the experiments and first-principle density functional theory (DFT) simulations, here, we investigate the influence of the imparted Cu atoms in Cu/Si on the oxidation of Si with the presence of H2O. The Cu addition causes the geometric distortion of the Si lat… Show more

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Cited by 2 publications
(2 citation statements)
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“…When the air-annealing temperature was raised to 400 °C, the annealed Cu 5 Si shows two small peaks at 2 θ = 43.1° and 46.2°, corresponding to the (002) and (101) planes of Cu 6.69 Si, respectively, indicating partial conversion of Cu 5 Si to Cu 6.69 Si either in the bulk or on the surface, which is probably a result of preferential exsolution of Si from the Cu 5 Si parent as the energy required to form Si oxides is much lower than that to form Cu oxides. 16 However, it is noted that no visible XRD peaks related to crystallized SiO 2 can be observed, suggesting that the exsolved Si oxides (SiO x ) most likely exist in an amorphous form that have been confirmed by surface-sensitive spectroscopic measurements ( vide infra ). Meanwhile, apart from this conversion, several characteristic XRD peaks at 50.2° and 73.6° for the metallic Cu and 35.5° and 38.7° for the CuO can be clearly observed for the Cu 5 Si during air-annealing.…”
mentioning
confidence: 97%
“…When the air-annealing temperature was raised to 400 °C, the annealed Cu 5 Si shows two small peaks at 2 θ = 43.1° and 46.2°, corresponding to the (002) and (101) planes of Cu 6.69 Si, respectively, indicating partial conversion of Cu 5 Si to Cu 6.69 Si either in the bulk or on the surface, which is probably a result of preferential exsolution of Si from the Cu 5 Si parent as the energy required to form Si oxides is much lower than that to form Cu oxides. 16 However, it is noted that no visible XRD peaks related to crystallized SiO 2 can be observed, suggesting that the exsolved Si oxides (SiO x ) most likely exist in an amorphous form that have been confirmed by surface-sensitive spectroscopic measurements ( vide infra ). Meanwhile, apart from this conversion, several characteristic XRD peaks at 50.2° and 73.6° for the metallic Cu and 35.5° and 38.7° for the CuO can be clearly observed for the Cu 5 Si during air-annealing.…”
mentioning
confidence: 97%
“…2,3 Our prior research highlighted unique low-temperature oxidation behavior in Cu 3 Si@Si particles, which transition into CuO@SiO x , as well as rapid Cu diffusion within Si particles at room temperature. 4,5 Concurrently, interest has surged in Cu-Si composites and their related derivatives, especially Cu on silica supports, due to their active participation in a wide range of catalytic reactions like hydrogenation, carbonization, and oxidation. [6][7][8] Extensive efforts have been made to load copper species with controlled sizes and shapes, which significantly influence catalytic performance, onto supports.…”
mentioning
confidence: 99%