Advancements in semiconductor technology are making gate-level test generation more challenging. This is because a large amount of detailed structural information must be processed in the search process of automatic test pattern generation (ATPG). In addition, ATPG needs to deal with new defects caused by process variation when IC is shrinking. To reduce the computation effort of ATPG, test generation could be started earlier at higher abstraction level, which is in line with top-down desig…
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