Study on the characteristics of ECR plasma spatial distribution

Fu, Si-Lie; Chen, Junfang; Hu, Shejun; Xian-qiu, WU; Lee, Yun; Fan, S H

doi:10.1088/0963-0252/15/2/003

Cited by 14 publications

(4 citation statements)

References 21 publications

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“…´at substrate level with an almost flat n r p ( ) behavior at approximately the same discharge pressure [59,60]. Both these results are similar to the results of Eddy et al, who found plasma densities at the substrate level between 2 10 10 ´cm −3 and 3 10 10 ´cm −3 (in Cl 2 /Ar mixtures, 500 W microwave power) [57].…”

Section: Langmuir Probe Measurementssupporting

confidence: 87%

Correlation of III/V semiconductor etch results with physical parameters of high-density reactive plasmas excited by electron cyclotron resonance

Franz

Meyer

Amann

2017

Plasma Sci. Technol.

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Reactive ion etching is the interaction of reactive plasmas with surfaces. To obtain a detailed understanding of this process, significant properties of reactive composite low-pressure plasmas driven by electron cyclotron resonance (ECR) were investigated and compared with the radial uniformity of the etch rate. The determination of the electronic properties of chlorine-and hydrogen-containing plasmas enabled the understanding of the pressure-dependent behavior of the plasma density and provided better insights into the electronic parameters of reactive etch gases. From the electrical evaluation of I(V ) characteristics obtained using a Langmuir probe, plasmas of different compositions were investigated. The standard method of Druyvesteyn to derive the electron energy distribution functions by the second derivative of the I(V ) characteristics was replaced by a mathematical model which has been evolved to be more robust against noise, mainly, because the first derivative of the I(V ) characteristics is used. Special attention was given to the power of the energy dependence in the exponent. In particular, for plasmas that are generated by ECR with EM modes, the existence of Maxwellian distribution functions is not to be taken as a self-evident fact, but the bi-Maxwellian distribution was proven for Ar-and Kr-stabilized plasmas. In addition to the electron temperature, the global uniform discharge model has been shown to be useful for calculating the neutral gas temperature. To what extent the invasive method of using a Langmuir probe could be replaced with the noninvasive optical method of emission spectroscopy, particularly actinometry, was investigated, and the resulting data exhibited the same relative behavior as the Langmuir data. The correlation with etchrate data reveals the large chemical part of the removal process-most striking when the data is compared with etching in pure argon. Although the relative amount of the radial variation of plasma density and etch rate is approximately 5%  , the etch rate shows a slightly concave shape in contrast to the plasma density.

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Section: Langmuir Probe Measurementssupporting

confidence: 87%

Correlation of III/V semiconductor etch results with physical parameters of high-density reactive plasmas excited by electron cyclotron resonance

Franz

Meyer

Amann

2017

Plasma Sci. Technol.

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“…These typically operate on volume sources at pressures of 10 -3 to 10 -2 torr. Electron-cyclotron ion sources can operate at pressures of about 10 -3 torr [Xu 2008] and can achieve uniform plasmas [Fu 2006]. The ion density at the accelerator grids must be very uniform to produce multiple beamlets that are each well focused.…”

Section: Neutral Beam Injectorsmentioning

confidence: 99%

Axisymmetric Magnetic Mirror Fusion-Fission Hybrid

Moir

Martovetsky

Molvik

et al. 2011

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The achieved performance of the gas dynamic trap version of magnetic mirrors and today's technology we believe are sufficient with modest further efforts for a neutron source for material testing (Q=P fusion /P input~0 .1). The performance needed for commercial power production requires considerable further advances to achieve the necessary high Q>>10. An early application of the mirror, requiring intermediate performance and intermediate values of Q~1 are the hybrid applications. The Axisymmetric Mirror has a number of attractive features as a driver for a fusion-fission hybrid system: geometrical simplicity, inherently steady-state operation, and the presence of the natural divertors in the form of end tanks. This level of physics performance has the virtue of low risk and only modest R&D needed and its simplicity promises economy advantages. Operation at Q~1 allows for relatively low electron temperatures, in the range of 4 keV, for the DT injection energy ~ 80 keV. A simple mirror with the plasma diameter of 1 m and mirror-to-mirror length of 35 m is discussed. Simple circular superconducting coils are based on today's technology. The positive ion neutral beams are similar to existing units but designed for steady state. A brief qualitative discussion of three groups of physics issues is presented: axial heat loss, MHD stability in the axisymmetric geometry, microstability of sloshing ions.

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“…More details about this ECR-PECVD system and the spatial plasma density distribution in the system can be found in Refs. [12,13].…”

Section: The Process Of Gan Film Grown With Ecr-mopecvdmentioning

confidence: 99%