2019
DOI: 10.1016/j.seppur.2019.03.069
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Study on the kinetics of iron removal from silicon diamond-wire saw cutting waste: Comparison between heterogeneous and homogeneous reaction methods

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Cited by 61 publications
(15 citation statements)
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“…In both stages, the leaching process is controlled by the second-order rate of a homogeneous reaction model . This assertion is consistent with the homogeneous reaction kinetic model previously published by the authors . The second view speculates that Ni debris present in DWSSP might be buried in the oxide layer, thus making the removal of oxide necessary to dissolve the Ni impurities .…”
Section: Introductionsupporting
confidence: 89%
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“…In both stages, the leaching process is controlled by the second-order rate of a homogeneous reaction model . This assertion is consistent with the homogeneous reaction kinetic model previously published by the authors . The second view speculates that Ni debris present in DWSSP might be buried in the oxide layer, thus making the removal of oxide necessary to dissolve the Ni impurities .…”
Section: Introductionsupporting
confidence: 89%
“…20 The authors' previous studies have investigated the kinetic mechanism of Al removal via HCl leaching, 21 the dissolution and mineralization behavior of metal elements, 22 and the Si core−SiO 2 shell structure. 23 Moreover, the kinetic mechanism of iron removal with H 2 SO 4 leaching, 24 multicomponent acid purification, 25 the combined process of slag treatment and acid leaching, 26 and acid leaching followed by induction furnace melting 27 have also been investigated by other research groups.…”
Section: ■ Introductionmentioning
confidence: 99%
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“…For diamond wire sawing, the cutting wire is coated with diamond particles, resulting in less impurities and higher wafer quality. Therefore, the latter has become the promising method for slicing silicon wafers. …”
Section: Introductionmentioning
confidence: 99%
“…Various research had been carried out to find ways to recover silicon from DWSSP. The proposed disposal methods included acid leaching method to remove metallic impurities in DWSSP, the two-stage thermal plasma process to recycle silicon from DWSSP, the vacuum carbothermal reduction and hydrobromination reaction method to eliminate silicon oxide, , the furnace aerosol method to remove the carbon contamination, and the slag treatment process for silicon recycling. , These previous works mainly focused on silicon recycling and purification and had already achieved remarkable results. Nevertheless, the impurities in DWSSP, especially boron, can affect the power generation efficiency of the photovoltaic industry and should be further removed.…”
Section: Introductionmentioning
confidence: 99%