Study on the Plasma-Polymer Thin Films Deposited by Using PECVD and Application Tests for Low-k Insulator

Abstract

Plasma-polymer pure ethylcyclohexane thin lms were deposited on Si(100) substrates at room temperature by using PECVD (plasma enhanced chemical vapor deposition). Hydrogen and argon gases were used as precursor bubbler and carrier gases, respectively. We also investigated the electrical and the physical properties of the plasma-polymer thin lms at various deposition RF powers and annealing temperatures. The as-grown and the annealed plasma-polymer thin lms were analyzed by using FT-IR (Fourier transform infrared spectroscopy) and SEM (scanning electron microscopy). The IR spectra showed that the plasma-polymer thin lms had totally dierent chemical functionalities from those of the ethylcyclohexane precursor and that the chemical functionalities of the thin lms changed with the RF power and annealing temperature. From the SEM results, we determined the thicknesses of the thin lms before and after the annealing, with the thickness shrinkage (%) being measured by using SEM cross-sectional images. An impedance analyzer was used to measure the capacitance and from the electrical property measurements, the lowest dielectric constant obtained was 1.71.

AC Electrical Properties of Plasma Polymerized o-Methoxyaniline Thin Films

“…The structural analyses suggest the cross linking nature in the PPOMA thin films which was also found by Blaszczyk-Lezak [28] from the plasma polymerized perylene thin films. It is found that the PPOMA films have chemical nature totally different from precursor OMA and this type of change was also observed by Cho et al [29].…”

“…Cho et al [29] investigated electrical and physical properties of plasmapolymerized as-grown and the annealed pure ethylcyclohexane thin films at various deposition RF powers and annealing temperatures by using plasma enhanced chemical vapor deposition (PECVD). The IR spectra showed that the plasma-polymer thin films had totally different chemical functionalities from those of the ethylcyclohexane precursor and that the chemical functionalities of the thin films changed with the RF power and annealing temperature.…”

Structural, morphological, compositional and optical studies of plasma polymerized 2-furaldehyde amorphous thin films

“…Blaszczyk-Lezak et al [43] studied the preparation and optical analysis of PP perylene films at varying thicknesses and observed that films are highly absorbent and fluorescent having RMS roughness within 0.3-0.4 nm. Cho et al [44] reported physical and electrical behaviours of PP as-grown and the annealed pure ethylcyclohexane thin films at several deposition RF powers and annealing temperatures via plasma enhanced chemical vapor deposition (PECVD). The FTIR spectra showed that the PP thin films had entirely different chemical structures from those of the monomer ethylcyclohexane.…”