Study optical properties of the thin HfO₂ coatings deposited by DC reactive magnetron sputtering

Abstract

Thin HfO2 films were deposited on polished microscope glass substrates by DC magnetron sputtering at bias voltages of -85 V, -100 V, -115 V, -130 V and -145 V. The deposited films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and UV-VIS-NIR spectrophotometry. The XRD results show the presence of a polycrystalline monoclinic phase. The roughness calculated from the AFM images increases as the bias voltage is raised to -130 V and then starts decreasing. The effect was also investigated of the bias voltage on the optical properties of the HfO2 films.

Study of the structure, roughness and optical properties of HfO2 coatings deposited on microscopic glass substrates

“…The technological conditions were optimized according to our previous investigations published in Ref. [20]. The phase composition of the coatings was assessed by X-ray diffraction (XRD).…”

“…The authors of [19] deposited HfO2 films on Si substrates and studied the influence of low temperatures on the structure and the optical properties of the produced films. In our previous work [20], the influence was studied of the bias voltage on the films' structure and optical properties. The results indicated a good correlation between the surface roughness and films' structure and the improved optical properties, but the reflection coefficient was not sufficiently high for uses in modern optical applications.…”