2013
DOI: 10.1016/j.optmat.2013.05.010
|View full text |Cite
|
Sign up to set email alerts
|

Sub-micrometric patterns written using a DIL method coupled to a TiO2 photo-resist

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
15
0

Year Published

2015
2015
2022
2022

Publication Types

Select...
9

Relationship

2
7

Authors

Journals

citations
Cited by 18 publications
(15 citation statements)
references
References 18 publications
0
15
0
Order By: Relevance
“…A TiO 2 sol-gel was formulated and prepared as explained in [5,6]. A layer of 350 nm thickness is deposited by dip-coating, with 10 mm height on the entire contour of the cylinder (or tube) of 15 mm length and 4 mm radius according to the same experimental protocol.…”
Section: Realization Of Tio 2 Gratings On a Cylinder And On The Intermentioning
confidence: 99%
See 1 more Smart Citation
“…A TiO 2 sol-gel was formulated and prepared as explained in [5,6]. A layer of 350 nm thickness is deposited by dip-coating, with 10 mm height on the entire contour of the cylinder (or tube) of 15 mm length and 4 mm radius according to the same experimental protocol.…”
Section: Realization Of Tio 2 Gratings On a Cylinder And On The Intermentioning
confidence: 99%
“…Our project aims to use the cylindrical photolithography on layers of photo-patternable and functional type of sol-gel [5,6], which acts as a negative photoresist under UV insolation and allows micro-structuration in a single lithographic step without additional etching. Indeed, the optical (high index) and photo-catalytic (self-cleaning) properties of the TiO 2 solgel may enable even more interesting applications for example in the environmental domain (in air [7] or water pollutants cleaning).…”
Section: Introductionmentioning
confidence: 99%
“…26,27,28 TiO 2 thin films show a large interest in the field of optics due to their high transparency in the visible spectrum, their high refractive index, as well as their photocatalytic activity and photo-induced superhydrophilicity. Besides, the use of sol-gel resists is also interesting for the manufacturing process, since the created structures can be used directly without post-process 29 , which is one of the main interests. Thus, it can cover a wide number of application fields since it can be cost-effective and compatible to large substrates 29 .…”
Section: Introductionmentioning
confidence: 99%
“…Then sol-gel thin film can be stabilized and cured either by annealing 31,32 to permit the evaporation of residual solvent still present inside the xerogel thin film or by photocuring. 33 The interest to use such inorganic polymers as material for nanoimprint lithography has been growing over the last decade. [28][29][30] In another way, studies have shown the benefit of using sol-gel films directly to obtain rough surfaces which promote the production of SERS signals.…”
Section: Introductionmentioning
confidence: 99%