Sub-Nanometer Level Size Tuning of a Monodisperse Nanoparticle Array Via Block Copolymer Lithography

Shin, Dong Ok; Lee, Jun Young; Moon, Hyoung-Seok; Jeong, Seong‐Jun; Kim, Ju Young; Mun, Jeong Ho; Cho, Heesook; Park, Soo‐Jin; Kim, Sang Ouk

doi:10.1002/adfm.201001396

Cited by 72 publications

(50 citation statements)

References 42 publications

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“…Block copolymer (BCP) self-assembly creates periodical pattern with the potential to reach feature sizes below 10 nm. 1,2 However, ordering is only obtained in grains smaller than a few tens of micrometers. Grain orientations are independent and randomly distributed, which prevents the acquisition of a long range ordering, which is a major drawback for device fabrication.…”

Section: Introductionmentioning

confidence: 99%

Direct top-down ordering of diblock copolymers through nanoimprint lithography

Kehagias¹,

Salhi²,

Baron³

et al. 2011

Journal of Vacuum Science & Technology B, Nanotechnology an

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Section: Introductionmentioning

confidence: 99%

Direct top-down ordering of diblock copolymers through nanoimprint lithography

Kehagias¹,

Salhi²,

Baron³

et al. 2011

Journal of Vacuum Science & Technology B, Nanotechnology an

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“…Research interest to bottom‐up approach is principally inspired by the potential capability to fabricate nanoscale materials and devices, whose characteristic dimension and pattern density can be beyond the limitation of conventional top‐down process . Such a bottom‐up approach, especially exploiting block copolymer (BCP) self‐assembly can generate large‐area well‐defined nanoscale surface patterns with sub‐10‐nm scale dimension in a scalable and cost effective manner . Significantly, BCP self‐assembly can be synergistically integrated with a traditional top‐down approach, such as photolithography, to direct the spatial registration and lateral ordering of nanoscale domains, which is generally referred as directed self‐assembly (DSA) .…”

Section: Introductionmentioning

confidence: 99%

Hierarchical Directed Self‐Assembly of Diblock Copolymers for Modified Pattern Symmetry

Choi

Kim

et al. 2016

Adv Funct Materials

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Block copolymer lithography exploiting diblock copolymer thin films is promising for scalable manufacture of device‐oriented nanostructures. Nonetheless, its intrinsic limitation in the degree of freedom for pattern symmetry within hexagonal dot or parallel line array greatly diminishes the potential application fields. Here, we report multi‐level hierarchical self‐assembled nanopatterning of diblock copolymers for modified pattern symmetry. Sequential hierarchical integration of two layers of diblock copolymer films with judiciously chosen molecular weights and chemical composition creates nanopatterned morphology with modified pattern symmetry, including sparse linear cylinder or lamellar arrays. Internal structure of the hierarchically patterned morphology is characterized by grazing‐incidence small‐angle X‐ray scattering throughout the film thickness. Pattern transfer of the modified nanopattern generates linear metal nanodot array with uniform size and regular spacing as a typical example of functional nanopatterned structures.

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“…The development of complex lateral superlattice structures composed of nano‐particles or nanopatterns has greatly enhanced the performance of a variety of nanotechnology and optoelectronic devices . Recently, moiré fringes resulting from the mismatch between two lattices were shown to be a powerful tool for the generation of micro‐ and nanoscale complex superlattice structures .…”

Section: Introductionmentioning

confidence: 99%

Hierarchical Ordering of Quantum Dots and Liquid with Tunable Super‐Periodicity into High Aspect Ratio Moiré Superlattice Structure

Cho

Jeon

Kim

et al. 2014

Adv Funct Materials

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wileyonlinelibrary.comincluding both bottom-up and top-down approaches, have been developed for the fabrication of complex superlattice structures using the moiré fringe technique. Several bottom-up fabrication methods, which include block-copolymers, [ 4 ] DNA crystals, [ 5 ] polymer microparticles, [ 6 ] colloidal crystals, [ 7 ] and self-assembled nanorod arrays, [ 8,9 ] have been suggested for the formation of moiré superlattice structures. However, such soft-material-based moiré superlattice structures contain many defects and imperfections over a large area, limiting their potential application in areas such as plasmonic substrates, [ 10,11 ] hard templates for lithography, [ 4 ] and self-assembly. [12][13][14] On the contrary, topdown approaches such as nano-imprint lithography, [ 15 ] ion-beam lithography, [ 16 ] mechano-photopatterning, [ 17 ] and rotational-photolithography [ 18 ] produce a highly crystalline superstructure without defects and imperfections, and with high accuracy and reproducibility. Despite considerable progress in this area, major challenges remain in the development of complex nano-scaled moiré patterns with multiple functions and multiple materials, and more research is required to greatly expand their application range. It is essential that the target materials for building up moiré patterns be diverse, from soft to hard materials, forming a robust superstructure. Having a diverse range of materials as candidates for forming moiré patterns can widen their range of application. In addition, complex superlattice structures having diverse functional properties should require only a simple fabrication method with high throughput, without needing complex process conditions or specialized optically sensitive materials.In the study described below, we have developed a new procedure for the construction of multi-functional complex moiré superlattice structures, through an advanced secondary sputtering lithography (SSL) technique. The SSL technique developed by our group can achieve 10 nm scale nano-patterns through the secondary sputtering phenomenon during the ion-bombardment process. [19][20][21][22] A signifi cant step was taken towards the realization of complex nano-scaled moiré superlattice structures, through the use of a multi-step SSL procedure. Along with control over the misorientation angle, we achieved highly periodic and high aspect ratio moiré superlattice In this work, a new approach for construction of high aspect ratio complex moiré superlattice structure with versatile super-periodicity is developed using the moiré fringe and secondary sputtering lithography. Wide assortments of high aspect ratio complex superstructures having different features on a 10 nm scaled wall are easily fabricated from simple starting components. More important is the fi nding of a new microscale phenomenon, consisting in trapping fl uids in the centres of the moiré hexagonal fringes, as the consequence of the modulation of local hydrophilicty of the pattern. Using this phenomenon, target mater...

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Sub-Nanometer Level Size Tuning of a Monodisperse Nanoparticle Array Via Block Copolymer Lithography

Cited by 72 publications

References 42 publications

Direct top-down ordering of diblock copolymers through nanoimprint lithography

Direct top-down ordering of diblock copolymers through nanoimprint lithography

Hierarchical Directed Self‐Assembly of Diblock Copolymers for Modified Pattern Symmetry

Hierarchical Ordering of Quantum Dots and Liquid with Tunable Super‐Periodicity into High Aspect Ratio Moiré Superlattice Structure

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