Submicron AZO Gratings and Diffuse Transmittance Distribution

Renchen, 刘仁臣 Liu; Yonggang, 吴永刚 Wu; Zihuan, 夏子奂 Xia; Pinglin, 唐平林 Tang; Zhaoming, 梁钊铭 Liang

doi:10.3788/aos201232.0731001

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“…The fabrication process was as follows [6]. First, an 1000nm AZO film was deposited on cleaned glass substrates at 200℃, then a layer of 700 nm AZ5206 positive photoresist (PR) was spin-coated at 3500 rpm on it and baked at 90℃ for 5 minutes to remove the solvent.…”

Section: Methodsmentioning

confidence: 99%

Antireflection and Scattering Properties of Two-Dimensional Hexagonal AZO Gratings on Glass Substrates

Liu

Xia

2013

KEM

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With photoresist dot arrays fabricated by a two-beam interference lithography as an etch mask, two-dimensional (2-D) hexagonal aluminum-doped zinc oxide（AZO）submicron gratings (SMG) with 160nm height (h) and different periods (P) were produced using lift-off transfer process. Results show that as P decreased to 487nm, SMG exhibited excellent antireflection properties, which reduced the average total reflectivity (Rtotal) from 11.8% of AZO thin film to 4.7% in the wavelength range of 400nm-1050nm, and promoted the total transmittance (Ttotal) significantly, especially in the long spectral range of 750nm-1050nm. On the other hand, as P increased from 487nm to 985nm, the haze parameters of reflectance (HR) or transmittance (HT) improved from 25.5% to 40.2% or from 15.1% to 36.8%, respectively. Nevertheless, P increased from 985nm to 1435nm, both Rtotal (or Ttotal) and HR (or HT) varied very slightly. Bidirectional distribution functions at normal incidence not only verified that the larger the P was, the part of diffuse reflectance (or transmittance) were much higher, but also further demonstrate the larger the P, the smaller the diffaction angle. In summary, 2-D hexagonal AZO SMG show promising antireflection effects at P less than 487nm, and show promising scattering abilities at P about 985nm.

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Section: Methodsmentioning

confidence: 99%