Submicron patterning of a catalyst film by scanning probe nanolithography for a selective chemical vapor deposition of carbon nanotubes

Parisse, Pietro; Verna, Adriano; Rinaldi, M; Bussolotti, Fabio; Grossi, V.; Passacantando, M.; Nardone, M.; Santucci, S.; Ottaviano, L.

doi:10.1063/1.2711144

Cited by 5 publications

(3 citation statements)

References 23 publications

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“…Parisse et al created ≈350 nm wide trenches in PMMA resist and subsequently deposited Ni catalyst, which was used to grow ≈40 nm diameter CNTs from the resulting Ni catalyst patterned areas. [245] Issues with the technique are poor throughput speed from the serial process, and currently poor line edge roughness due to ripping of the resist. A simpler way to use a resist is simply apply an ink-based temperature-resistant polymer over a catalyst-coated substrate and grow CNTs via CVD from the uncovered regions.…”

Section: Patterned Resistmentioning

confidence: 99%

Nanoscale Patterning of Carbon Nanotubes: Techniques, Applications, and Future

Corletto

Shapter

2020

Advanced Science

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Carbon nanotube (CNT) devices and electronics are achieving maturity and directly competing or surpassing devices that use conventional materials. CNTs have demonstrated ballistic conduction, minimal scaling effects, high current capacity, low power requirements, and excellent optical/photonic properties; making them the ideal candidate for a new material to replace conventional materials in next-generation electronic and photonic systems. CNTs also demonstrate high stability and flexibility, allowing them to be used in flexible, printable, and/or biocompatible electronics. However, a major challenge to fully commercialize these devices is the scalable placement of CNTs into desired micro/nanopatterns and architectures to translate the superior properties of CNTs into macroscale devices. Precise and high throughput patterning becomes increasingly difficult at nanoscale resolution, but it is essential to fully realize the benefits of CNTs. The relatively long, high aspect ratio structures of CNTs must be preserved to maintain their functionalities, consequently making them more difficult to pattern than conventional materials like metals and polymers. This review comprehensively explores the recent development of innovative CNT patterning techniques with nanoscale lateral resolution. Each technique is critically analyzed and applications for the nanoscale-resolution approaches are demonstrated. Promising techniques and the challenges ahead for future devices and applications are discussed.

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Section: Patterned Resistmentioning

confidence: 99%

Nanoscale Patterning of Carbon Nanotubes: Techniques, Applications, and Future

Corletto

Shapter

2020

Advanced Science

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“…Controlled synthesis of single carbon nanofiber per defined location is crucial for implementation of microfabricated focused field emitter arrays [1], scanning probe tips [2], gene delivery arrays [3], protein scaffolds [4], and various other applications [5,6]. Directed growth of carbon nanotubes obtained via atomic force nanolithography has been reported by Parisse et al [7]. In these devices, the functionality is hampered by the presence of more than one nanofiber per site.…”

Section: Introductionmentioning

confidence: 99%

Pulsed laser dewetting of nickel catalyst for carbon nanofiber growth

et al. 2008

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We present a pulsed laser dewetting technique that produces single nickel catalyst particles from lithographically patterned disks for subsequent carbon nanofiber growth through plasma enhanced chemical vapor deposition. Unlike the case for standard heat treated Ni catalyst disks, for which multiple nickel particles and consequently multiple carbon nanofibers (CNFs) are observed, single vertically aligned CNFs could be obtained from the laser dewetted catalyst. Different laser dewetting parameters were tested in this study, such as the laser energy density and the laser processing time measured by the total number of laser pulses. Various nickel disk radii and thicknesses were attempted and the resultant number of carbon nanofibers was found to be a function of the initial disk dimension and the number of laser pulses.

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“…Nanoscale devices are now routinely designed by means of electron beam lithography (EBL), or focused ion beam (FIB) lithography, but their use is primarily restricted to research and prototypical applications, as device production in this case is sequential and time consuming [1]. Scanning probe nanolithography is similarly sequential [2,3], although parallel nanowriting can be foreseen [4]. Nanoimprint lithography, i.e.…”

mentioning

confidence: 99%

Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric lithography

Ottaviano

Bussolotti

Piperno

et al. 2008

Plasma Sources Sci. Technol.

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An extremely promising complete nanofabrication process of metallic patterns, to achieve periodic structure resolution well below 100 nm, has been successfully demonstrated. The process includes the EUV patterning encoding on the photoresist and its transfer from the polymer onto a Si substrate using a 46.9 nm table top soft x-ray laser and an interference lithography scheme. After optimizing the PMMA-poly(methyl methacrylate)-preparation thickness and development, by controlling the metal deposition and subsequent liftoff process on the exposed PMMA/SiO 2 /Si(1 0 0) samples, we have fabricated large arrays of 200 nm spaced nickel strips on Si surfaces.

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Submicron patterning of a catalyst film by scanning probe nanolithography for a selective chemical vapor deposition of carbon nanotubes

Cited by 5 publications

References 23 publications

Nanoscale Patterning of Carbon Nanotubes: Techniques, Applications, and Future

Nanoscale Patterning of Carbon Nanotubes: Techniques, Applications, and Future

Pulsed laser dewetting of nickel catalyst for carbon nanofiber growth

Fabrication of metallic micropatterns using table top extreme ultraviolet laser interferometric lithography

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