Suboxide/subnitride formation on Ta masks during magnetic material etching by reactive plasmas

Hu, Li; Muraki, Y.; Karahashi, Kazuhiro; Hamaguchi, Satoshi

doi:10.1116/1.4919925

Cited by 26 publications

(21 citation statements)

References 31 publications

(22 reference statements)

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“…The Ta 4f high-resolution spectrum contains three pairs of Ta 4f double peaks belonging to three chemical states of tantalum, shown in Figure 7b. The Ta 4f 7/2 peaks associated with Ta 4+ (TaO 2 ), Ta 3+ (Ta 2 O 3 ), and Ta 2+ (TaO) are located at 24.4 eV, 24 eV, 23.6 eV respectively, and the spin-orbit splitting of Ta 4f 7/2 to Ta 4f 5/2 is 1.8ev, agrees with reported values [59,60,61]. The value state of Ta is related to the concentration of oxygen and the temperature during or after oxidation.…”

Section: Resultssupporting

confidence: 91%

Fabrication and Performance of ZnO Doped Tantalum Oxide Multilayer Composite Coatings on Ti6Al4V for Orthopedic Application

Ding

et al. 2019

Nanomaterials

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Ti6Al4V titanium alloy has been widely used as medical implant material in orthopedic surgery, and one of the obstacles preventing it from wide use is toxic metal ions release and bacterial implant infection. In this paper, in order to improve corrosion resistance and antibacterial performance of Ti6Al4V titanium alloy, ZnO doped tantalum oxide (TaxOy) multilayer composite coating ZnO-TaxOy/TaxOy/TaxOy-TiO2/TiO2/Ti (ZnO-TaxOy) was deposited by magnetron sputtering at room temperature. As a comparison, monolayer TaxOy coating was prepared on the surface of Ti6Al4V alloy. The morphology and phase composition of the coatings were investigated by field emission scanning electron microscopy (FE-SEM) and X-ray diffraction (XRD), the elemental chemical states of coating surfaces were investigated by X-ray photoelectron spectroscope (XPS). The adhesion strength and corrosion resistance of the coatings were examined by micro-scratch tester and electrochemical workstations, respectively. The results show that the adhesion strength of multilayer ZnO-TaxOy coating is 16.37 times higher than that of single-layer TaxOy coating. The ZnO-TaxOy composite coating has higher corrosion potential and lower corrosion current density than that of TaxOy coating, showing better corrosion inhibition. Furthermore, antibacterial test revealed that multilayer ZnO-TaxOy coating has a much better antibacterial performance by contrast.

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Section: Resultssupporting

confidence: 91%

Fabrication and Performance of ZnO Doped Tantalum Oxide Multilayer Composite Coatings on Ti6Al4V for Orthopedic Application

Ding

et al. 2019

Nanomaterials

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“…2 of Ref. 24, although they are represented here as the etching rates rather than the sputtering yields given in Ref. 24.…”

Section: Resultsmentioning

confidence: 99%

“…[21][22][23] A previous study of Ref. 24 shows that the sputtering yield of Ta by energetic CO þ ions strongly depends on the ion irradiation angle and suggests that the strong angular dependence may be caused by angular dependence of surface oxidation.…”

Section: Introductionmentioning

confidence: 95%

Correlation between dry etching resistance of Ta masks and the oxidation states of the surface oxide layers

Satake

Yamada

et al. 2015

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Mechanisms of dry etching resistance of Ta masks, which are widely used for magnetic random access memory etching processes, have been investigated for a better understanding of their faceting characteristics. In magnetic-material etching processes by CO/NH 3 or CH 3 OH plasmas, CO þ ion is considered as one of the most dominant ion species irradiating the substrate surface. An earlier study by Li et al. [J. Vac. Sci. Technol. A 33, 040602 (2015)] has shown that the Ta sputtering yield by CO þ ion irradiation depends strongly on the ion irradiation angle and the level of the surface oxidation. In this study, the primary focus is placed on the effects of surface oxidation and physical sputtering only (without possible chemical effects of carbon) on the etching rate of Ta, and the etching characteristics of Ta and Ta 2 O 5 have been examined with Ar þ and/or oxygen ion beams. It has been found that there is a strong negative correlation between the etching rate of Ta and the oxidation states of the surface oxide layer formed during the etching process; the higher the oxidation states are, the lower the etching rate becomes. The results indicate that a strong propensity of a Ta mask to taper by irradiation of oxidizing ions (i.e., strong ion-irradiation-angle dependence of the Ta etching rate) arises from less efficient oxidation of a tapered surface by incident oxidizing ions, which enter the surface with an oblique angle. V

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“…The etching of metals also has the problem of the redeposition of etching by-products. 12,[188][189][190][191][192][193][194][195][196][197] In self-limiting formation, another difficulty arises for intermetallic compounds or alloys such as CoFe, NiFe, CrFe, and PtMn. Simply, in etching processes for compounds such as high-k materials, dichalcogenides, GaAs, GaP, and GaN, it is difficult to maintain the surface stoichiometry during and after the etching.…”

Section: Future Challengesmentioning

confidence: 99%

Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions?

Ishikawa

Karahashi

Ichikı

et al. 2017

Jpn. J. Appl. Phys.

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In this review, we discuss the progress of emerging dry processes for nanoscale fabrication. Experts in the fields of plasma processing have contributed to addressing the increasingly challenging demands in achieving atomic-level control of material selectivity and physicochemical reactions involving ion bombardment. The discussion encompasses major challenges shared across the plasma science and technology community. Focus is placed on advances in the development of fabrication technologies for emerging materials, especially metallic and intermetallic compounds and multiferroic, and two-dimensional (2D) materials, as well as state-of-the-art techniques used in nanoscale semiconductor manufacturing with a brief summary of future challenges.

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Suboxide/subnitride formation on Ta masks during magnetic material etching by reactive plasmas

Cited by 26 publications

References 31 publications

Fabrication and Performance of ZnO Doped Tantalum Oxide Multilayer Composite Coatings on Ti6Al4V for Orthopedic Application

Fabrication and Performance of ZnO Doped Tantalum Oxide Multilayer Composite Coatings on Ti6Al4V for Orthopedic Application

Correlation between dry etching resistance of Ta masks and the oxidation states of the surface oxide layers

Progress and prospects in nanoscale dry processes: How can we control atomic layer reactions?

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