Substrate bias voltage influenced structural, electrical and optical properties of dc magnetron sputtered Ta2O5 films

Multiphase Structure of Tantalum Oxynitride TaOxNy Thin Films Deposited by Reactive Magnetron Sputtering

“…Indeed, by adjusting the oxygen-to-nitrogen ratio, it is possible to tune their physical, chemical, and functional properties, making these materials attractive for microelectronic, optical applications, and as biocompatible coatings. − In particular, tantalum oxynitrides TaO x N y are of scientific interest because they benefit from both the properties of tantalum oxides and tantalum nitrides. So, tantalum oxide Ta 2 O 5 has been well-known for its large band gap (4.5 eV, i.e., ∼280 nm), high refractive index ( n ∼ 2.3 at 633 nm), high dielectric constant (ε r ∼ 25), and transparency in a wide wavelength range from 300 nm to 2 μm. , As a result, Ta 2 O 5 thin films were found interesting for use as antireflection coatings, optical waveguides, and metal oxide semiconductor devices. − Other applications of Ta 2 O 5 films include corrosion barrier coatings, solid state oxygen sensors, and thin film catalysts. , On the other hand, tantalum nitride is known as a chemically inert, corrosion-resistant, and hard ceramic. − Tantalum nitride films are applied for diffusion barriers and resistors in micro- and optoelectronics, heat-resistant layers in mechanical industry, and biocompatible coatings. , …”