Substrate effect on the optical properties and thickness of diamond-like carbon films deposited by the RF PACVD method

Śmietana, Mateusz; Bock, Wojtek J.; Szmidt, J.; Grabarczyk, J.

doi:10.1016/j.diamond.2010.08.012

Cited by 38 publications

(16 citation statements)

References 35 publications

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“…The effect can be related to a modification of internal structure of the film or to a stress in the films induced by the substrate with the increase of their thickness [29]. The phenomenon remains in contradiction with the variations of n for the films deposited with other CVD methods where the increase of the film thickness is typically followed by an increase of n [30]. Since in other vapor-based thin film deposition methods plasma or high temperature modifies the film during the deposition, in case of the ALD more likely the substrate effect induces a decrease of the n with the film thickness.…”

Section: Resultsmentioning

confidence: 99%

Capability for Fine Tuning of the Refractive Index Sensing Properties of Long-Period Gratings by Atomic Layer Deposited Al2O3 Overlays

Śmietana

Myśliwiec

Mikulic

et al. 2013

Sensors

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This work presents an application of thin aluminum oxide (Al2O3) films obtained using atomic layer deposition (ALD) for fine tuning the spectral response and refractive-index (RI) sensitivity of long-period gratings (LPGs) induced in optical fibers. The technique allows for an efficient and well controlled deposition at monolayer level (resolution ∼ 0.12 nm) of excellent quality nano-films as required for optical sensors. The effect of Al2O3 deposition on the spectral properties of the LPGs is demonstrated experimentally and numerically. We correlated both the increase in Al2O3 thickness and changes in optical properties of the film with the shift of the LPG resonance wavelength and proved that similar films are deposited on fibers and oxidized silicon reference samples in the same process run. Since the thin overlay effectively changes the distribution of the cladding modes and thus also tunes the device's RI sensitivity, the tuning can be simply realized by varying number of cycles, which is proportional to thickness of the high-refractive-index (n > 1.6 in infrared spectral range) Al2O3 film. The advantage of this approach is the precision in determining the film properties resulting in RI sensitivity of the LPGs. To the best of our knowledge, this is the first time that an ultra-precise method for overlay deposition has been applied on LPGs for RI tuning purposes and the results have been compared with numerical simulations based on LP mode approximation.

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Section: Resultsmentioning

confidence: 99%

Capability for Fine Tuning of the Refractive Index Sensing Properties of Long-Period Gratings by Atomic Layer Deposited Al2O3 Overlays

Śmietana

Myśliwiec

Mikulic

et al. 2013

Sensors

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“…After the cleaning, substrates were fully rinsed and immersed in high-purity dionized water. Horiba Jobin-Yvon UVSEL spectroscopic ellipsometer (Horiba Scientific, Edison New Jersey, NJ, USA) with the wavelength ranging from 250 to 750 nm was used to determine the thickness ( d ) and optical properties of investigated SiN x films, i.e ., their refractive index ( n ) and extinction coefficient ( k ) [26,27]. To fit the measurement data to a physical model, a three-layer model (Si wafer/SiO 2 /SiN x ) was used where a single-layer Tauc-Lorentz dispersion formula [28] of SiN x film was applied and fitted with mean-square error χ 2 < 5.…”

Section: Methodsmentioning

confidence: 99%

Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films

2014

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In this paper we investigate influence of radio frequency plasma enhanced chemical vapor deposition (RF PECVD) process parameters, which include gas flows, pressure and temperature, as well as a way of sample placement in the reactor, on optical properties and deposition rate of silicon nitride (SiNx) thin films. The influence of the process parameters has been determined using Taguchi’s orthogonal tables approach. As a result of elevating samples above the electrode, it has been found that deposition rate strongly increases with distance between sample and the stage electrode, and reaches its maximum 7 mm above the electrode. Moreover, the refractive index of the films follows increase of the thickness. The effect can be observed when the thickness of the film is below 80 nm. It has been also found that when the deposition temperature is reduced down to 200 °C, as required for many temperature-sensitive substrate materials, the influence of the substrate material (Si or oxidized Si) can be neglected from the point of view of the properties of the films. We believe that the obtained results may help in designing novel complex in shape devices, where optical properties and thickness of thin plasma-deposited coatings need to be well defined.

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“…4. The relationship of (a) n and k over the classification of the deposited amorphous carbon films modified from previous works 14,15,[25][26][27][28] with the wavelength at 550 nm; (b) Tauc-gap E g with E k and E n-max; (c) hydrogen contents with E k and E n-max ; and (d) sp 2 /(sp 2 þ sp 3 ) ratios with E k and E n-max .…”

Section: à4mentioning

confidence: 99%

Structural analysis of amorphous carbon films by spectroscopic ellipsometry, RBS/ERDA, and NEXAFS

Zhou

Suzuki

Nakajima

et al. 2017

Applied Physics Letters

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The structural analysis of amorphous carbon films is not only the premise of their unique properties applied in the industrial fields but also the indispensable element on their classification. In this letter, we refurbished the classification of amorphous carbon films based on the optical constants in terms of the refractive index (n) and the extinction coefficient (k). In the selected photon energy range, we defined the maximum of n (En-max) and k at a value more than 10−4 (Ek) to explore the relationship between different classification schemes for amorphous carbon films deposited by different techniques. We found that Ek and En-max of the deposited amorphous carbon films have an exponential relationship with the hydrogen contents. Thus, the spectroscopic ellipsometry analysis can also be used as one of the effective methods for the structural evaluation of the amorphous carbon films.

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Substrate effect on the optical properties and thickness of diamond-like carbon films deposited by the RF PACVD method

Cited by 38 publications

References 35 publications

Capability for Fine Tuning of the Refractive Index Sensing Properties of Long-Period Gratings by Atomic Layer Deposited Al2O3 Overlays

Capability for Fine Tuning of the Refractive Index Sensing Properties of Long-Period Gratings by Atomic Layer Deposited Al2O3 Overlays

Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films

Structural analysis of amorphous carbon films by spectroscopic ellipsometry, RBS/ERDA, and NEXAFS

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