2022
DOI: 10.1021/acsaem.1c04077
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Sulfur Vacancy-Mediated Electron–Hole Separation at MoS2/CdS Heterojunctions for Boosting Photocatalytic N2 Reduction

Abstract: Defect engineering is considered as an efficient method for improving the photocatalytic activity of semiconductor photocatalysis because defects can not only serve as trapping centers for electrons and holes but also work as active sites for reaction. Herein, we synthesized a series of MoS2/CdS heterojunctions with abundant sulfur vacancies and used for photocatalytic N2 reduction. The sulfur vacancies at MoS2/CdS heterojunctions were confirmed by UV–vis diffuse-reflectance spectroscopy (UV-DRS) and electron … Show more

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Cited by 28 publications
(17 citation statements)
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“…[ 151 ] Sulfur vacancies as active sites for N 2 adsorption were constructed by Zheng et al. [ 151 ] and electrons trapped by the defects could be transferred to the π orbitals of adsorbed N 2 , resulting in the weakening of the N≡N bond and the subsequent formation of N 2 *. Simultaneously, H* released from the surface of the metal sulfides permits the sequential hydrogenation of N 2 and the formation of *NNH.…”
Section: Emerging Issues and Design Principlesmentioning
confidence: 99%
See 1 more Smart Citation
“…[ 151 ] Sulfur vacancies as active sites for N 2 adsorption were constructed by Zheng et al. [ 151 ] and electrons trapped by the defects could be transferred to the π orbitals of adsorbed N 2 , resulting in the weakening of the N≡N bond and the subsequent formation of N 2 *. Simultaneously, H* released from the surface of the metal sulfides permits the sequential hydrogenation of N 2 and the formation of *NNH.…”
Section: Emerging Issues and Design Principlesmentioning
confidence: 99%
“…In addition, defect engineering enables coordinatively unsaturated metal sites on metal sulfides for N 2 chemisorption, thus reducing the energy barriers for N 2 reduction. [151] Sulfur vacancies as active sites for N 2 adsorption were constructed by Zheng et al [151] and electrons trapped by the defects could be transferred to the π orbitals of adsorbed N 2 , resulting in the weakening of the N≡N bond and the subsequent formation of N 2 *. Simultaneously, H* released from the surface of the metal sulfides permits the sequential hydrogenation of N 2 and the formation of *NNH.…”
Section: Design Principles Of Metal Sulfidesmentioning
confidence: 99%
“…The peak at 303 cm −1 belongs to the characteristic peak of the 1-Longitudinal optical (LO) phonon vibration modes of CdS. 41,42 In Figures 3d and S4b and TiO 2 /Au30/CdS may lead to the reduction of the Raman intensity compared to that of TiO 2 /Au10/CdS. XPS analysis has been used for investigating the valence states of the obtained coatings.…”
Section: Structural Characteristics Figures 1 and S3 Displaymentioning
confidence: 99%
“… Here, A i and τ i represent the intensity and individual lifetime values obtained from the exponential equation. The τ 1 corresponds to radiative emission due to direct interband photoexcited charge carrier recombination, and the decay time τ 2 is ascribed to the indirect recombination of trapped charge carriers . The longer decay time (τ 2 ) of hierarchical HT-In 2 O 3 /M II In 2 S 4 composites as compared to pure HT-In 2 O 3 is attributed to slow recombination of photogenerated electron–hole pairs.…”
Section: Resultsmentioning
confidence: 99%
“…The τ 1 corresponds to radiative emission due to direct interband photoexcited charge carrier recombination, and the decay time τ 2 is ascribed to the indirect recombination of trapped charge carriers. 50 The longer decay time (τ 2 ) of hierarchical HT-In 2 O 3 /M II In 2 S 4 composites as compared to pure HT-In 2 O 3 is attributed to slow recombination of photogenerated electron− hole pairs. The calculated average emission lifetime of the HT-In 2 O 3 /ZIS (1:1) nanocomposite (5.0 ns) is higher than that of HT-In 2 O 3 /MIS (1:1) (4.5 ns) and HT-In 2 O 3 /CIS (1:1) (4.4 ns) as well as pure In 2 O 3 (3.4 ns) materials.…”
Section: Light Absorption and Photogenerated Charge Separation Perfor...mentioning
confidence: 97%