2019
DOI: 10.1063/1.5131664
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Superconducting nanowire single-photon detectors fabricated from atomic-layer-deposited NbN

Abstract: High-quality ultra-thin films of niobium nitride (NbN) are developed by plasma-enhanced atomic layer deposition (PEALD) technique. Superconducting nanowire single-photon detectors (SNSPDs) patterned from this material exhibit high switching currents and saturated internal efficiencies over a broad bias range at 1550 nm telecommunication wavelength. Statistical analyses on hundreds of fabricated devices show near-unity throughput yield due to exceptional homogeneity of the films. The ALD-NbN material represents… Show more

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Cited by 34 publications
(23 citation statements)
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“…It is, therefore, more suitable to pattern the SNSPD after waveguide fabrication, which makes the lithography step for SNSPDs particularly challenging. Furthermore, both demonstrations employed specially tailored deposition processes for the superconducting thin film to avoid excessive heating, which is incompatible to LN thin films [423,424]. From our own experience, on bulk LN, pyroelectric effect tends to cause electrostatic discharge and damage the nanowires under rapid temperature change.…”
Section: Detectorsmentioning
confidence: 99%
“…It is, therefore, more suitable to pattern the SNSPD after waveguide fabrication, which makes the lithography step for SNSPDs particularly challenging. Furthermore, both demonstrations employed specially tailored deposition processes for the superconducting thin film to avoid excessive heating, which is incompatible to LN thin films [423,424]. From our own experience, on bulk LN, pyroelectric effect tends to cause electrostatic discharge and damage the nanowires under rapid temperature change.…”
Section: Detectorsmentioning
confidence: 99%
“…To date, it appears that amorphous superconductors are favourable for the high-yield fabrication of SNSPDs with consistent properties. However, a recent report on NbN detectors realized by plasma-enhanced atomic layer deposition demonstrated excellent yield and reproducibility [211], which highlights the promising prospects for SNSPD technology upscaling via improving thin film deposition. Further advances in materials science and fabrication technology combined with developments in characterization and metrology tools for defect analysis would also allow the local identification of SNSPD failure mechanisms, which would in turn provide crucial input for the rational development of industrial detector fabrication processes to achieve superior device reliability.…”
Section: Advances In Science and Technology To Meet Challengesmentioning
confidence: 99%
“…A thin oxide layer (10 nm thickness) is deposited on top of the fabricated photonic devices in order to protect LN from the adverse effect of the subsequent NbN etching by CF 4 chemistry. Next, a thin layer of NbN (5 nm effective thickness) is deposited by the technique of plasmaenhanced atomic layer deposition (PEALD) 29 . The transition temperature and sheet resistance of the deposited NbN film are measured to be around 8 K and 410 Ω/sq, respectively.…”
mentioning
confidence: 99%