Superhydrophobic nanostructured silicon surfaces with controllable broadband reflectance

Cho, Seong Jin; An, Taechang; Kim, Jin Young; Sung, Jungwoo; Lim, Geunbae

doi:10.1039/c1cc11615k

Cited by 40 publications

(42 citation statements)

References 25 publications

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“…[ 20 ] However, achieving well-defi ned, tunable textures with feature sizes less than 100 nm using these methods remains challenging. Block-copolymer-based thin-fi lm patterning [24][25][26][27] can provide a potential solution because of its high spatial resolution and large area (>cm 2 ) throughput.…”

Section: Doi: 101002/adma201304006mentioning

confidence: 99%

“…[ 17,18 ] Indeed, previous studies have shown that nanoscale features alone can achieve similar static contact angles and contact angle hysteresis compared with hierarchical surfaces. [19][20][21] In particular, surfaces textured at the sub-100 nm length scale may achieve the robustness required for applications such as automotive and aircraft windshields, and steam turbine power generators, where fl uids are subjected to high pressures or when droplets impact solid surfaces at speeds in excess of 10 m s −1 . They may also enable integration of SH coatings with antifouling and low fl ow-resistance into nanofl uidic devices.…”

mentioning

confidence: 99%

“…In turn, such fundamental understanding will facilitate rational design of highly robust SH surfaces.Previous approaches to creating these types of nanostructured surfaces have employed optical lithography, [ 21 ] chemical vapor deposition, [ 19 ] and maskless deep reactive ion etching. [ 20 ] However, achieving well-defi ned, tunable textures with feature sizes less than 100 nm using these methods remains challenging. Block-copolymer-based thin-fi lm patterning [24][25][26][27] can provide a potential solution because of its high spatial resolution and large area (>cm 2 ) throughput.…”

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confidence: 99%

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Robust Superhydrophobicity in Large‐Area Nanostructured Surfaces Defined by Block‐Copolymer Self Assembly

2013

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Section: Doi: 101002/adma201304006mentioning

confidence: 99%

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Robust Superhydrophobicity in Large‐Area Nanostructured Surfaces Defined by Block‐Copolymer Self Assembly

2013

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“…Currently, several methods have been reported to grow Si-NWs vertically, viz., chemical vapor deposition (CVD), nanoparticles-assisted etching, reactive-ion etching (RIE), etc. (Yi et al 2011;Krylyuk et al 2010;Moutanabbir et al 2011;Shin and Filler 2012;Zhong et al 2011;Chen et al 2010;Huang et al 2008;Geyer et al 2012;Yuan et al 2012;Chang et al 2012;Cho et al 2011;Sainiemi et al 2011;Garnett and Yang 2010;Zhu et al 2009). The SiNWs prepared by these methods exhibit promising photoelectron conversion characteristics.…”

Section: Introductionmentioning

confidence: 99%

Fabrication and optical simulation of vertically aligned silicon nanowires

et al. 2015

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Silicon nanowires (Si-NWs) have been considered widely as a perfect light absorber with strong evidence of enhanced optical functionalities. Here we report finite-difference time-domain simulations for Si-NWs to elucidate the key factors that determine enhanced light absorption, energy flow behavior, electric field profile, and excitons generation rate distribution. To avoid further complexity, a single Si-NW of cylindrical shape was modeled on c-Si and optimized to elucidate the aforementioned characteristics. Light absorption and energy flow distribution confirmed that Si-NW facilitates to confine photon absorption of several orders of enhancement whereas the energy flow is also distributed along the wire itself. With reference to electric field and excitons generation distribution it was revealed that Si-NW possesses the sites of strongest field distributions compared to those of flat silicon wafer. To realize the potential of Si-NWs-based thin film solar cell, a simple process was adopted to acquire vertically aligned Si-NWs grown on c-Si wafer. Further topographic characterizations were conducted through scanning electron microscope and tunneling electron microscope-coupled energy-dispersive spectroscopy.

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“…Superhydrophobic surfaces with a high water contact angle (WCA) of >150° and a low sliding angle (<10°) provide very attractive functionalities for many applications [1][2][3][4], such as self-cleaning, anti-icing, and drag-reduction coatings. The contact angle of the hydrophobic surface depends on the surface chemistry and roughness of the surface.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of a Superhydrophobic Water-Repellent Mesh for Underwater Sensors

An¹

2013

Journal of Sensor Science and Technology

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This is an Open Access article distributed under the terms of the Creative Commons Attribution Non-Commercial License(http://creativecommons.org/licenses/bync/3.0)which permits unrestricted non-commercial use, distribution, and reproduction in any medium, provided the original work is properly cited.Journal of Sensor Science and Technology Vol. 22, No. 2 (2013) AbstractA superhydrophobic mesh is a unique structure that blocks water, while allowing gases, sound waves, and energy to pass through the holes in the mesh. This mesh is used in various devices, such as gas-and energy-permeable waterproof membranes for underwater sensors and electronic devices. However, it is difficult to fabricate micro-and nano-structures on three-dimensional surfaces, such as the cylindrical surface of a wire mesh. In this research, we successfully produced a superhydrophobic water-repellent mesh with a high contact angle (>150°) for nanofibrous structures. Conducting polymer (CP) composite nanofibers were evenly coated on a stainless steel mesh surface, to create a superhydrophobic mesh with a pore size of 100 µm. The nanofiber structure could be controlled by the deposition time. As the deposition time increased, a high-density, hierarchical nanofiber structure was deposited on the mesh. The mesh surface was then coated with Teflon, to reduce the surface energy. The fabricated mesh had a static water contact angle of 163°, and a water-pressure resistance of 1.92 kPa.

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Superhydrophobic nanostructured silicon surfaces with controllable broadband reflectance

Cited by 40 publications

References 25 publications

Robust Superhydrophobicity in Large‐Area Nanostructured Surfaces Defined by Block‐Copolymer Self Assembly

Robust Superhydrophobicity in Large‐Area Nanostructured Surfaces Defined by Block‐Copolymer Self Assembly

Fabrication and optical simulation of vertically aligned silicon nanowires

Fabrication of a Superhydrophobic Water-Repellent Mesh for Underwater Sensors

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