2004
DOI: 10.1016/j.jcrysgro.2003.11.044
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Suppression of indium vaporization from GaN/GaInN superlattice by BP capping layer

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Cited by 3 publications
(2 citation statements)
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“…One of the most common ways to make BP is through bulk synthesis techniques, such as flux growth or solid-state reaction. 30,[76][77][78][79] Thin-film deposition of BP is almost invariably carried out by CVD of some kind, either metal-organic chemical vapor deposition (MOCVD), 73,80,81 or standard CVD, 68,[70][71][72]74,75,[82][83][84][85] or even plasma-enhanced CVD. 86 Other, less common deposition methods include vapor-liquid-solid growth, 87,88 thermal evaporation from powders in vacuum, 89 or sputtering in phosphine/Ar atmosphere.…”
Section: Boron Phosphidementioning
confidence: 99%
“…One of the most common ways to make BP is through bulk synthesis techniques, such as flux growth or solid-state reaction. 30,[76][77][78][79] Thin-film deposition of BP is almost invariably carried out by CVD of some kind, either metal-organic chemical vapor deposition (MOCVD), 73,80,81 or standard CVD, 68,[70][71][72]74,75,[82][83][84][85] or even plasma-enhanced CVD. 86 Other, less common deposition methods include vapor-liquid-solid growth, 87,88 thermal evaporation from powders in vacuum, 89 or sputtering in phosphine/Ar atmosphere.…”
Section: Boron Phosphidementioning
confidence: 99%
“…In addition, there are related heterostructure studies of GaN and BP semiconductors. When these studies are examined, it is seen that they are suppression of the indium vaporization of the GaN/ GaInN super-cell with the BP cover layer [26], the role of BP in the growth of GaN on Si [27], obtaining GaN on Si substrates using Si thin films [28], (0001) morphological study of GaN on Si (100) substrates using buffer layer selective epitaxial growth [29] and (0001) of the dual position growth of (111) BP [30]. The doping of Te atom to the system affects the field emission properties of nanowires.…”
Section: Introductionmentioning
confidence: 99%