1998
DOI: 10.1103/physrevb.57.11879
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Suppression of Ostwald ripening inIn0.5Ga0.5Asquantum dots on a vicinal (100) substrate

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Cited by 63 publications
(31 citation statements)
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“…The growth interruption (GI) is one of the key growth parameters for the fabrication of high-quality, selfassembled quantum dots (QDs) by molecular beam epitaxy (MBE) or metal-organic chemical vapor deposition (MOCVD) [1,2]. The evolution of QD morphology through the GI is of great technological interest.…”
Section: Introductionmentioning
confidence: 99%
“…The growth interruption (GI) is one of the key growth parameters for the fabrication of high-quality, selfassembled quantum dots (QDs) by molecular beam epitaxy (MBE) or metal-organic chemical vapor deposition (MOCVD) [1,2]. The evolution of QD morphology through the GI is of great technological interest.…”
Section: Introductionmentioning
confidence: 99%
“…Other reports show the coexistence of different types of islands [9] and a shape transition from small pyramid-shaped islands to dome-shaped islands [10]. In InGaAs͞GaAs QD formation, ripening has also been observed upon annealing, which can be partially suppressed by steps in miscut substrates [11]. Ripening in QDs would have obvious disadvantages for applications of island-based devices; therefore, determining if stable islands can be achieved is of both practical and fundamental interest.…”
mentioning
confidence: 99%
“…7 dots on vicinal substrates is smaller than that of dots on exact substrates [10], the better optical properties of dots on vicinal substrates is attributed to better material quality. On vicinal substrates, the binding effect of the step edges can limit the possible size of QDs [21]. Thus the number of plastically relaxed dots which act as nonradiative centers is reduced, leading to an increase of radiative recombination.…”
Section: Article In Pressmentioning
confidence: 99%