Surface and interface characterization of diamond coatings deposited on pure titanium

Yan, Bibo; Loh, Nee Lam; Fu, Yong Qing; Sun, Chang Q.; Hing, Peter

doi:10.1016/s0257-8972(99)00248-0

Cited by 45 publications

(17 citation statements)

References 17 publications

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“…If one considers that both these effects increase with increasing film thickness, the tendency to delaminate exhibited by the thicker films grown for 4 and 5 h can be easily rationalized. [14,15] In Figure 2 are evidenced the edges of craters produced by the partial detachment of the diamond film in the D4 (a) and D5 (b) samples.…”

Section: Morphological Analysismentioning

confidence: 99%

Exploiting the Properties of Ti‐Doped CVD‐Grown Diamonds for the Assembling of Electrodes

Tamburri

Carcione

Vitale

et al. 2017

Adv Materials Inter

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controlled electrical conductivity. The insulating nature of the diamond phase precluded the use of diamond in electro chemistry, and at that time conductivity could be induced in diamond films only by ion implantation. However, as indi cated by the first report [1] the results were not satisfactory because of the structural damages produced by the ions in the dia mond lattice. After the pioneering works by Derjaguin et al., [2] Varnin et al., [3] and Spitsyn et al., [4] the beginning of the "diamond electrochemistry" era started with the settling up and developing of chemical vapor deposition (CVD) metho dologies and the definition of protocols for the growth of the diamond phase under conditions far from the thermo dynamic equilibrium.The feasibility of doping the growing diamond lattice during CVD processes stimulated the development of efficient routes for the realization of highquality, robust, and wearresistant new type of carbon electrodes, to be used for the entire range of the electrochemical applications, from oxidation/reduction reactions, to qualitative and quantitative electroanalysis, to power generation and storage. [5] During the last decades the general trend was to use boron as dopant of diamond. Borondoped diamond (BDD) consti tutes certainly the more common class of conductive diamonds, due to the wellestablished ptype semiconductor behavior and the interesting electrochemical properties of such hybrid system. [6][7][8] However, there are several criticalities related to the use of B to dope CVD diamond layers. First, whereas resistivity of about 10 −3 Ω cm can be achieved with B concentrations up to 10 21 cm −3 , [9] the electrical properties of such structures are dom inated by impurity band conduction with a low mobility that degrades the conducting behavior of the material. [10] Another criticality is related to the high toxicity of boron and to the con sequent limitations in the use of Bdoped electrodes in applica tions requiring biocompatibility.Several other elements such as N, P, Na, Li, Ti, W, and Nd have been proposed as dopants to induce in diamonds a con ductive or semiconductive behavior and to match specific tech nological requirements. [5] A hybrid chemical vapor deposition (CVD)-powder flowing technique specifically developed in lab has been employed to produce high-quality polycrystalline diamond layers containing Ti inclusions. Morphology, structural features, and surface composition of nanocomposite diamond-based samples produced by different growth times have been analyzed by scanning electron microscopy, Raman and Auger spectroscopy, respectively. The CVD methodology adopted for the Ti incorporation in the diamond lattice does not perturb the crystalline quality of the diamond matrix, therefore maintaining the outstanding properties of the C-sp 3 phase. The functional properties of the nanocomposite layers have been tested by nanoindentation and I-V measurements. The electrochemical performance of the diamond/Ti electrodes is evaluated by performing cyclic voltammetry in ...

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Section: Morphological Analysismentioning

confidence: 99%

Exploiting the Properties of Ti‐Doped CVD‐Grown Diamonds for the Assembling of Electrodes

Tamburri

Carcione

Vitale

et al. 2017

Adv Materials Inter

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show abstract

“…These important aspects are not shown in an earlier model 11 which does not take surface roughness and competitive growth into consideration. There are reports on the porous intermediate layer of TiC on titanium substrate 13 , and some porous structure in the diamond film 1 . As the adhesion strength is directly related to the contacting area between the film and the substrate, neither the bottom area of the film nor the area of the substrate surface under the film could be counted as contacting area.…”

Section: Growth Model Of Diamond Film With High Nucleation Densitymentioning

confidence: 99%

Study of diamond film interface structure and contacting area

Setasuwon

Metanawin

2009

Mat. Res.

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High purity diamond film has been grown by refined Combustion Flame method with high oxygen proportion. Snapshots of time series of the diamond film forming were taken and a model was derived. By observing the period of seeding to coalescing of diamond crystals to form film, it is realized that the contacting area is small and the calculated value was less than 15%. It is also found that the base layer of the film was porous as a result of non-uniform crystal growth. To enhance adhesion of the film, the contacting area between the film and the substrate must be increased, and the porous base layer must be thin and dense as much as possible. To achieve that, very high and uniform nucleation is the key. Under this view, the nanocrystalline diamond film on smooth substrate is preferred than rough surface to have strong adhesion.

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“…8 Adherent diamond coatings are proven to be very effective for improving their wear and frictional behaviour. [9][10][11] This interest is due to the combination of the outstanding properties of diamond. Its high hardness, elastic modulus, low friction coefficients, and ambient thermal conductivity, as well as its invulnerability to most corrosive environments make it an outstanding material for many tribological applications.…”

Section: Introductionmentioning

confidence: 99%

“…However, diamond coatings with only high internal compressive stresses were obtained. 9,14,15 Amazingly, there are few reports available in the published literature on how to solve the above mentioned problems or about the deposition of NCD film on pure Ti using CH 4 /H 2 mixture in which the issue of interfacial adhesion is relevant for tribological applications.…”

Section: Introductionmentioning

confidence: 99%

Tribological characteristics of nanocrystalline diamond films grown on titanium

Askari

2009

Surface Engineering

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Nanocrystalline diamond (NCD) films on titanium alloys are of importance for tribology and biomedical implants. However, due to the different thermal expansion coefficients of the two materials, the complex nature of the interlayer formed during diamond deposition, and the difficulty in achieving very high nucleation density, it is difficult to deposit adherent thin NCD films on titanium and its alloys. In the present study smooth NCD films were successfully deposited in microwave chemical vapour deposition plasma from CH 4 /H 2 mixtures, for the purpose of improving the film's adhesion and the wear resistance of the titanium. An exceptional adhesion of NCD film to the titanium substrate was observed by indentation testing up to 150 kg load. The friction coefficient against a cemented carbide ball of 10 mm in diameter with 20 N load was estimated to be y0?05 in dry air. Detailed experimental results of the preparation, characterisation and successful deposition of the NCD film on pure Ti are discussed.

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Surface and interface characterization of diamond coatings deposited on pure titanium

Cited by 45 publications

References 17 publications

Exploiting the Properties of Ti‐Doped CVD‐Grown Diamonds for the Assembling of Electrodes

Exploiting the Properties of Ti‐Doped CVD‐Grown Diamonds for the Assembling of Electrodes

Study of diamond film interface structure and contacting area

Tribological characteristics of nanocrystalline diamond films grown on titanium

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