Surface characterization

Kane, Philip F.; Larrabee, Graydon B.

doi:10.1021/ac50013a015

Cited by 17 publications

(9 citation statements)

References 166 publications

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“…One of the most common process steps in integrated circuit fabrication is the water rinsing of the Si wafer. Several studies have employed surface IR absorption spectroscopy to examine this process on Si(100) surfaces ( − ). For H 2 O exposure and annealing, the results indicate that an oxide forms through initial insertion into the dimer bonds followed by insertion into the back-bonds ( C1 ).…”

Section: Optical Characterization Of Surfacesmentioning

confidence: 99%

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Surface Characterization

et al. 1999

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Reviews of surface characterization have appeared in Analytical Chemistry every two years since 1977 (1-11). The field continues to grow and diversify with new surface analysis techniques as well as new applications. This review is similar to the last one in this series, being written by multiple authors with different specialties in an attempt to highlight advances in each of these areas. This review begins with literature from January 1997 and ends with literature from approximately October, 1998.

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Section: Optical Characterization Of Surfacesmentioning

confidence: 99%

“…Reviews of surface characterization have appeared in Analytical Chemistry every two years since 1977 ( − ). The field continues to grow and diversify with new surface analysis techniques as well as new applications.…”

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confidence: 99%

Surface Characterization

et al. 1999

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“…Tektronix, Incorporated, P.O. Box 500,Beaverton,Oregon 97077 This review follows the format of the previous review (641) and covers surface characterization as discussed in earlier reviews (637)(638)(639)(640). Tables are used extensively in order to summarize the material being reviewed.…”

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confidence: 99%

Surface characterization

McGuire¹

1987

Anal. Chem.

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“…NTIS. 61 pp (1979) This review follows the same format used in the three earlier reviews (453,454,541). The references are in general restricted to English-language journals or easily available translations and the surface is defined as the gas-solid interface.…”

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confidence: 99%

Forensic science

Brettell¹,

Saferstein²

1983

Anal. Chem.

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He Joined the company in 1959 as a radiochemist. His current work is directed toward developing advanced techniques for semiconductor materials characterization using electron beam (scanning Auger) and in microprobe techniques for chemical imperfections. X-ray topography, and scanning transmission electron microscopy techniques for physical imperfections. Larrabee earned a B.Sc. from the University ol Bishop's College In Quebec and an M.Sc. in chemistry from McMaster University in Ontario, Canada. He has published in analytical, electrochemical, and instrumentation journals and contributed chaplers In books. He has coauthored a book on the characterization of semiconductor materials and coedited a book on the characterization of solid surfaces. Larrabee is a member of the ACS, Electrochemical Society, SAS, and the Dallas Society of Analytical Chemists. R. Allen Bowling received his B.S. In Chemistry from the University ol Alabama and a Ph.D. In Chemistry from ihe University of Tennessee.He held an Alexander von Humboldt postdoctoral research position at the Institute ol Inorganic Chemistry, University of Frankfurt, West Germany, from March 1979 to July 1980. He joined Texas Instruments Incorporated in September 1980 as a process control engineer in a semiconductor processing area. In January 1982, he became a member of the technical staff in the Materials Characterization Branch of the Materials Science Laboratory of Texas Instruments, where he is presently responsible for Auger and XPS instrumentation. Bowling is a member of the Electrochemical Society and the American Vacuum Society.

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Surface characterization

Cited by 17 publications

References 166 publications

Surface Characterization

Surface Characterization

Surface characterization

Forensic science

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