Surface characterization and microstructure of ITO thin films at different annealing temperatures

Multifractal analysis of ITO thin films prepared by electron beam deposition method

“…The (2 2 2) plane has the strongest line for all investigated annealing temperatures. Our result is consistent with Kobayashi et al [33], Salehi [32] and our previous work [8]. Fig.…”

“…ITO thin films are the most widely used material as a transparent electrode of organic light emitting diode (OLED) and also in many other display devices like liquid crystal display (LCD) or plasma display panel (PDP). ITO thin films have been prepared by a variety of methods, such as pulsed laser deposition [2], dc and rf magnetron sputtering [3,4], spray pyrolysis [5], sol-gel process [6], electron beam evaporation [7,8], and so on. The control of surface morphology of ITO is one of the most critical problems.…”

The correlation of stoichiometry between boron-rich LaB6 targets and LaB6 films

“…The chamber was pumped down to a base pressure of 6 Â 10 À 4 Pa, and glass substrates were ultrasonically cleaned in acetone and absolute EtOH alternately. Targets were pre-sputtered for about 30 min to remove the surface oxides [19,20]. For the deposition of LaB 6 films, high purity Ar (99.999%) was introduced through a mass flow controller and the sputtering pressure was 1.5 Pa.…”

Получение наноостровковых пленок Sn, Al, Cu и исследование их электропроводящих свойств

“…Многочисленные авторы неоднократно рассматривали как теоретические аспекты, так и прак-тические возможности формирования наноостровковых покрытий посредством распада сплошных сверхтонких плeнок при термическом отжиге [3][4][5][6][9][10][11][12][13][14][15].…”