Surface characterization of thin layers of aluminium oxide

Elasticity Study of Nanostructured Al and Al-Si(Cu) Films

“…For a present specimen film constrained by a reed-substrate, E f may be explained by " E com . It is reported that amorphous alumina is formed as a 2-3 nm thick film on the surface of aluminum metal on exposure to the atmosphere at room temperature 22) and the Young's modulus of amorphous alumina thin films is 177-219 GPa. 23) In the following, we assume that E oxide is 198 GPa and t oxide varies among specimen metals, where E oxide and t oxide are the Young's modulus and the thickness of a surface oxide film, respectively.…”

Structural and chemical analysis of annealed plasma-enhanced atomic layer deposition aluminum nitride films

“…Therefore, the deep valley at 735 cm À1 in all of the FTIR spectra can be attributed to stretching band of Al-O complex. 18,52 In addition, a much weaker band at 960 cm À1 could also be assigned to similar alumina groups. 49,52 However, there is no clear evolvement of these valleys with respect to annealing temperatures or the N 2 :H 2 flow ratio alterations except that at 1000 C the intensity of 735 cm , thus including the AlN phonon modes.…”

“…18,52 In addition, a much weaker band at 960 cm À1 could also be assigned to similar alumina groups. 49,52 However, there is no clear evolvement of these valleys with respect to annealing temperatures or the N 2 :H 2 flow ratio alterations except that at 1000 C the intensity of 735 cm , thus including the AlN phonon modes. 42 It is difficult to determine the exact structure of the AlO x from this region which has many bands superimposed.…”

Corrosion studies of DC reactive magnetron sputtered alumina coating on 304 SS

“…Complexities in the properties of alumina exist due to the presence of a wide range of different crystalline phases such as α, , δ, η, χ, θ and k-alumina [8,9]. α-Al 2 O 3 can be deposited by chemical vapor deposition (CVD) and physical vapor deposition (PVD) [10]. Generally, the crystalline structure of α, k and θ-Al 2 O 3 is formed by chemical vapor deposition, while η and phases are formed by oxidation of aluminum metal, depending on the conditions.…”

“…Generally, the crystalline structure of α, k and θ-Al 2 O 3 is formed by chemical vapor deposition, while η and phases are formed by oxidation of aluminum metal, depending on the conditions. Depending on the technique selected and its processing parameters, various options are available for surface modifications [10].…”